⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methylthiouracil SCHEMBL159989 | 0.70 | — | — | |
| Methylthiouracil SCHEMBL5798462 | 0.68 | SMN1; SMN2 (0.95) | — | |
| SCHEMBL29955654 | 0.67 | SMN1; SMN2 (0.50) | — | |
| SCHEMBL5692483 | 0.65 | CYP2C19 (1.00) | — | |
| Water SCHEMBL29958102 | 0.65 | SMN1; SMN2 (0.48) | — | |
| SCHEMBL28943079 | 0.64 | LPO (0.47) | — | |
| SCHEMBL10489669 | 0.61 | LPO (0.55) | — | |
| SCHEMBL11738182 | 0.60 | CYP2C19 (0.47) | — | |
| SCHEMBL12872719 | 0.60 | CYP1A2 (0.68) | — | |
| SCHEMBL21328426 | 0.60 | TSHR (0.53) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8841062-B2 | Positive working photosensitive material | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-09-23 | — | — | US | claimed |
| US-20140154624-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2014-06-05 | — | — | US | claimed |
| US-4002479-A | ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-11 | — | — | US | claimed |
| US-12619149-B2 | DNQ-free chemically amplified resist composition | MERCK PATENT GMBH (DE) | 2026-05-05 | — | — | US | disclosed |
| US-12393115-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2025-08-19 | — | — | US | disclosed |
| US-20250244669-A1 | COMPOSITIONS AND METHODS OF IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH | EMD PERFORMANCE MATERIALS CORP. | 2025-07-31 | — | — | US | disclosed |
| US-12360453-B2 | PAG-free positive chemically amplified resist composition and methods of using the same | MERCK PATENT GMBH (DE) | 2025-07-15 | — | — | US | disclosed |
| CN-114651212-B | Positive photosensitive material | 默克专利股份有限公司 | 2025-05-02 | — | — | CN | disclosed |
| EP-4433873-A2 | COMPOSITIONS AND METHODS FOR IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH | Merck Patent GmbH (DE) | 2024-09-25 | — | — | EP | disclosed |
| CN-112654928-B | Positive photosensitive material | 默克专利股份有限公司 | 2024-09-24 | — | — | CN | disclosed |
| CN-118642327-A | Chemically amplified positive photosensitive composition, method for producing molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2024-09-13 | — | — | CN | disclosed |
| US-10976662-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2021-04-13 | — | — | US | disclosed |
| EP-3446180-B1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-04-01 | — | — | EP | disclosed |
| EP-2929397-B1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-03-18 | — | — | EP | disclosed |
| US-20190278178-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD FOR MANUFACTURING PLATED ARTICLE | TOKYO INSTITUTE OF TECHNOLOGY (JP) | 2019-09-12 | — | — | US | disclosed |
| EP-2929397-A2 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2015-10-14 | — | — | EP | disclosed |
| US-8841062-B2 | Positive working photosensitive material | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-09-23 | — | — | US | disclosed |
| WO-2014086846-A2 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2014-06-12 | — | — | WO | disclosed |
| US-20140154624-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2014-06-05 | — | — | US | disclosed |
| US-4002479-A | ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-11 | — | — | US | disclosed |