SCHEMBL15580586

SCHEMBL15580586

CCCc1ccc(OC(=O)c2cccc3ccccc23)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.54
POLB P06746 1/20 0.54
GAA P10253 1/20 0.54
PLA2G1B P04054 1/20 0.52
ATG4B Q9Y4P1 1/20 0.52
MAPT P10636 3/20 0.52
SMN1; SMN2 Q16637 2/20 0.52
NPC1 O15118 1/20 0.52
CASP3 P42574 1/20 0.52
RAB9A P51151 1/20 0.52
SENP8 Q96LD8 1/20 0.52
SENP7 Q9BQF6 1/20 0.52
SENP6 Q9GZR1 1/20 0.52
CACNA1B Q00975 1/20 0.50
APBA1 Q02410 1/20 0.50
PTGS2 P35354 1/20 0.50
THRB P10828 1/20 0.49
CDC25B P30305 1/20 0.48
KDM4E B2RXH2 5/20 0.48
TDP1 Q9NUW8 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18020598 0.90 KMT2A (0.57) KMT2APOLBGAAMAPTSMN1; SMN2
SCHEMBL16610058 0.84 NPC1 (0.59) KMT2APOLBGAAMAPTSMN1; SMN2
SCHEMBL28813458 0.81 CACNA1B (0.59) KMT2APOLBGAAMAPTNPC1
SCHEMBL2462911 0.80 KDM4E (0.71) KMT2APOLBGAAMAPTSMN1; SMN2
SCHEMBL28151828 0.80 POLB (0.44) KMT2APOLBGAAMAPTCACNA1B
SCHEMBL27372539 0.79 KDM4E (0.69) KMT2APOLBGAAMAPTSMN1; SMN2
SCHEMBL28137423 0.79 KDM4E (0.69) KMT2APOLBGAAMAPTSMN1; SMN2
SCHEMBL14461704 0.78 HPGD (0.48) KMT2APOLBGAAMAPTSMN1; SMN2
SCHEMBL11338507 0.78 PTGS2 (0.56) KMT2APLA2G1BATG4BMAPTSMN1; SMN2
SCHEMBL29290132 0.78 KMT2A (0.60) KMT2APOLBGAAMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9235116-B2 Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern FUJIFILM CORPORATION (JP) 2016-01-12 US disclosed
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 US disclosed