SCHEMBL15655878

SCHEMBL15655878

CC(C)[O-].CC(C)[O-].CC(C)[O-].CC[Ti+3]

nearest known ligand 0.40

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10934747 0.78 TSHR (0.38) TSHR
SCHEMBL4596586 0.78 TSHR (0.38) TSHR
SCHEMBL733468 0.78 TSHR (0.38) TSHR
SCHEMBL9840663 0.78 TSHR (0.38) TSHR
SCHEMBL135960 0.75 ALDH1A1 (0.30) TSHR
SCHEMBL1003101 0.73 TSHR (0.40) TSHR
SCHEMBL863596 0.73 TSHR (0.50) TSHR
SCHEMBL22405661 0.73 TSHR (0.40) TSHR
SCHEMBL20557983 0.73 TSHR (0.40) TSHR
SCHEMBL1552881 0.73 TSHR (0.40) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160291470-A1 PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM, AND ELEMENT HAVING PROTECTIVE FILM CHI MEI CORPORATION (TW) 2016-10-06 US disclosed
US-9093279-B2 Thin film forming composition for lithography containing titanium and silicon NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-07-28 US disclosed
EP-2735904-A1 THIN FILM FORMATION COMPOSITION FOR LITHOGRAPHY WHICH CONTAINS TITANIUM AND SILICON Nissan Chemical Industries, Ltd. (JP) 2014-05-28 EP disclosed
US-20140120730-A1 THIN FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING TITANIUM AND SILICON NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-05-01 US disclosed