Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 4/20 | 0.42 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.42 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.42 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.41 |
| ▸ | CES1 | P23141 | 9/20 | 0.38 |
| ▸ | FAAH | O00519 | 9/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | GGPS1 | O95749 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18008466 | 1.00 | CES2 (0.42) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL18008051 | 1.00 | CES2 (0.42) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL18009133 | 1.00 | CES2 (0.42) | CES2LPAR1LPAR3EPHX1CES1 | |
| Ammonia Solution, Strong SCHEMBL18007869 | 0.98 | CES2 (0.41) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL18007910 | 0.98 | CES2 (0.41) | CES2LPAR1LPAR3EPHX1CES1 | |
| Ammonia Solution, Strong SCHEMBL18008376 | 0.98 | CES2 (0.41) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL18008916 | 0.98 | CES2 (0.41) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL18007894 | 0.98 | CES2 (0.41) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL18008236 | 0.98 | CES2 (0.39) | CES2LPAR1LPAR3EPHX1CES1 | |
| Ammonia Solution, Strong SCHEMBL18008168 | 0.97 | CES2 (0.40) | CES2LPAR1LPAR3EPHX1CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170059992-A1 | RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-9046782-B2 | Resist composition for negative tone development and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-9023579-B2 | Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-8709704-B2 | Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method | FUJIFILM CORPORATION (JP) | 2014-04-29 | — | — | US | disclosed |