SCHEMBL15735641

SCHEMBL15735641

CCO[Si](CCCCc1ccc(F)cc1)(OCC)OCC

nearest known ligand 0.45

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 3/20 0.39
ALDH1A1 P00352 1/20 0.38
GAA P10253 1/20 0.38
MAPT P10636 1/20 0.38
HTT P42858 1/20 0.38
KMT2A Q03164 1/20 0.38
CYP19A1 P11511 1/20 0.37
HPGD P15428 1/20 0.37
FFAR1 O14842 1/20 0.37
FFAR4 Q5NUL3 1/20 0.37
AOC3 Q16853 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
RAB9A P51151 1/20 0.36
POLB P06746 1/20 0.36
APEX1 P27695 1/20 0.36
TDP1 Q9NUW8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15736064 0.98 TAAR1 (0.38) TAAR1ALDH1A1GAAMAPTHTT
SCHEMBL15733795 0.98 TAAR1 (0.38) TAAR1ALDH1A1GAAMAPTHTT
SCHEMBL15735383 0.95 TAAR1 (0.40) TAAR1ALDH1A1GAAMAPTHTT
SCHEMBL15733865 0.92 ALDH1A1 (0.36) TAAR1ALDH1A1GAAMAPTHTT
SCHEMBL15737395 0.92 ALDH1A1 (0.36) TAAR1ALDH1A1GAAMAPTHTT
SCHEMBL25293615 0.91 ALDH1A1 (0.39) ALDH1A1GAAMAPTKMT2AHPGD
SCHEMBL15737837 0.91 ALDH1A1 (0.35) TAAR1ALDH1A1GAAMAPTHTT
SCHEMBL15736942 0.91 ALDH1A1 (0.35) TAAR1ALDH1A1GAAMAPTHTT
SCHEMBL15737957 0.91 ALDH1A1 (0.35) TAAR1ALDH1A1GAAMAPTHTT
SCHEMBL15738900 0.91 ALDH1A1 (0.35) TAAR1ALDH1A1GAAMAPTHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2927936-B1 METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE SHINETSU CHEMICAL CO (JP) 2021-06-02 EP disclosed
US-10727410-B2 Surface modifier for transparent oxide electrode, surface-modified transparent oxide electrode, and method for producing surface-modified transparent oxide electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-28 US disclosed
CN-109872830-A Production method for the surface modifier of metal electrode, surface-modified metal electrode and surface-modified metal electrode 信越化学工业株式会社 2019-06-11 CN disclosed
US-9947871-B2 Surface modifier for metal electrode, surface-modified metal electrode, and method for producing surface-modified metal electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-04-17 US disclosed
CN-107141313-A Transparent oxide electrode and its production method that surface modifier, surface for transparent oxide electrode are modified 信越化学工业株式会社 2017-09-08 CN disclosed
US-20150295176-A1 SURFACE MODIFIER FOR METAL ELECTRODE, SURFACE-MODIFIED METAL ELECTRODE, AND METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-15 US disclosed
EP-2927936-A1 SURFACE MODIFYING AGENT FOR METAL ELECTRODES, SURFACE-MODIFIED METAL ELECTRODE, AND METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE Shin-Etsu Chemical Co., Ltd. (JP) 2015-10-07 EP disclosed
CN-104823266-A Surface modifier for metal electrode, surface-modified metal electrode, and method for producing surface-modified metal electrode SHINETSU CHEMICAL CO 2015-08-05 CN disclosed
CN-103848859-A Surface modifier for transparent oxide electrode, surface-modified transparent oxide electrode, and method for producing same SHINETSU CHEMICAL CO 2014-06-11 CN disclosed
EP-2738230-A1 Surface modifier for transparent oxide electrode, surface-modified transparent oxide electrode, and method for producing surface-modified transparent oxide electrode Shin-Etsu Chemical Co., Ltd. (JP) 2014-06-04 EP disclosed
US-20140147628-A1 Surface Modifier For Transparent Oxide Electrode, Surface-Modified Transparent Oxide Electrode, And Method For Producing Surface-Modified Transparent Oxide Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-05-29 US disclosed