Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRR1 | P24046 | 2/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.45 |
| ▸ | BLM | P54132 | 1/20 | 0.39 |
| ▸ | ACE2 | Q9BYF1 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | LTA4H | P09960 | 1/20 | 0.36 |
| ▸ | ACACB | O00763 | 1/20 | 0.33 |
| ▸ | ACACA | Q13085 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | FOLH1 | Q04609 | 2/20 | 0.31 |
| ▸ | NAALAD2 | Q9Y3Q0 | 2/20 | 0.31 |
| ▸ | ENPEP | Q07075 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16897672 | 0.90 | BLM (0.47) | GABRR1CYP1A2BLMACE2ALDH1A1 | |
| SCHEMBL20825478 | 0.85 | ACE2 (0.44) | GABRR1CYP1A2BLMACE2ALDH1A1 | |
| SCHEMBL27868134 | 0.83 | GABRR1 (0.45) | GABRR1CYP1A2BLMACE2LTA4H | |
| SCHEMBL28496019 | 0.79 | CYP3A4 (0.34) | ALDH1A1TDP1LMNACYP3A4TSHR | |
| SCHEMBL3753790 | 0.78 | GABRR1 (0.52) | GABRR1CYP1A2BLMACE2LTA4H | |
| SCHEMBL27286922 | 0.78 | GABRR1 (0.52) | GABRR1CYP1A2BLMACE2LTA4H | |
| Acetic Acid SCHEMBL31288634 | 0.78 | TDP1 (0.41) | ALDH1A1TDP1LMNACYP3A4TSHR | |
| SCHEMBL986918 | 0.76 | CA2 (0.53) | ALDH1A1TDP1TSHRMEN1GAA | |
| SCHEMBL10595182 | 0.76 | GABRR1 (0.42) | GABRR1CYP1A2BLMACE2LTA4H | |
| SCHEMBL28466762 | 0.76 | GABRR1 (0.50) | GABRR1CYP1A2BLMACE2LTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 313 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-4804577-B2 | — | — | 2011-11-02 | — | — | JP | claimed |
| US-20100085518-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2010-04-08 | — | — | US | claimed |
| WO-2008102990-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2008-08-28 | — | — | WO | claimed |
| WO-2008078953-A1 | BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME | LG CHEM, LTD. (KR) | 2008-07-03 | — | — | WO | claimed |
| EP-0260994-B1 | PROCESS FOR PRODUCING INTEGRATED CIRCUIT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-15 | — | — | EP | claimed |
| CN-122094772-A | Method for producing laminated film, and method for separating CO2 | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122094826-A | Method for producing laminate and method for separating CO2 | — | 2026-05-26 | — | — | CN | disclosed |
| EP-4621487-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING CURCUMIN DERIVATIVE | Nissan Chemical Corporation (JP) | 2025-09-24 | — | — | EP | disclosed |
| WO-2025121031-A1 | COPOLYMER | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| WO-2025121033-A1 | METHOD FOR PRODUCING COPOLYMER | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| WO-2025121034-A1 | RESIN COMPOSITION, MODIFIED RESIN COMPOSITION, AND METHOD FOR PRODUCING MODIFIED RESIN COMPOSITION | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| WO-2025120878-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE COLORING COMPOSITION, AND COLOR FILTER | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| US-20010041769-A1 | Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1142928-A1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR Corporation (JP) | 2001-10-10 | — | — | EP | disclosed |
| EP-0634696-B2 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-31 | — | — | EP | disclosed |
| US-6114086-A | COMPRISING ALKALI-SOLUBLE RESIN, DISSOLUTION CONTROLLING AGENTS, PHOTOACID GENERATOR, SOLVENT; USED FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES OR INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2000-09-05 | — | — | US | disclosed |
| US-5916729-A | A POSITIVE TONE TYPE REISTS CONSISTS OF A RESIN WHICH HAS AN ACIDIC FUNCTIONAL GROUP PROTECTED BY AN ACID DECOMPOSABLE GROUP AND IS HYDROLYZABLE, A PHOTOACID GENERATOR AND A SOLVENT MIXTURE OF ALKYL LACTATE WITH PROPYLENE GLYCOL ETHER | JSR CORPORATION (JP) | 1999-06-29 | — | — | US | disclosed |
| EP-0634696-B1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5629135-A | ALKALI-SOLUBLE RESIN, CROSSLINKER, PHOTOACID GENERATOR, SOLVENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-13 | — | — | US | disclosed |
| EP-0634696-A1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |