Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.52 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.43 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.43 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.43 |
| ▸ | HTR2A | P28223 | 1/20 | 0.43 |
| ▸ | HTR2C | P28335 | 1/20 | 0.43 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.43 |
| ▸ | HRH1 | P35367 | 1/20 | 0.43 |
| ▸ | DRD3 | P35462 | 1/20 | 0.43 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.43 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.43 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | SLC1A1 | P43005 | 6/20 | 0.41 |
| ▸ | SLC1A2 | P43004 | 6/20 | 0.41 |
| ▸ | SLC1A3 | P43003 | 5/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.38 |
| ▸ | GCLC | P48506 | 2/20 | 0.37 |
| ▸ | GRIK1 | P39086 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8168639 | 0.82 | CA2 (0.57) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL125406 | 0.82 | CA2 (0.71) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL29045240 | 0.82 | CHRM1 (0.37) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL29108049 | 0.82 | CA2 (0.60) | CA2MAPK1CA1 | |
| SCHEMBL1408565 | 0.82 | FOLH1 (0.50) | CHRM1AKR1A1CHRM3HTR2AHTR2C | |
| SCHEMBL29019883 | 0.80 | CA1 (0.44) | CA2TDP1CA1 | |
| SCHEMBL22127579 | 0.79 | CA2 (0.47) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL6617648 | 0.78 | CA2 (0.60) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL584092 | 0.78 | CA2 (0.60) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL6386008 | 0.78 | GABRR1 (0.52) | CHRM1AKR1A1CHRM3HTR2AHTR2C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 315 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-4804577-B2 | — | — | 2011-11-02 | — | — | JP | claimed |
| US-20100085518-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2010-04-08 | — | — | US | claimed |
| WO-2008102990-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2008-08-28 | — | — | WO | claimed |
| WO-2008078953-A1 | BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME | LG CHEM, LTD. (KR) | 2008-07-03 | — | — | WO | claimed |
| EP-0260994-B1 | PROCESS FOR PRODUCING INTEGRATED CIRCUIT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-15 | — | — | EP | claimed |
| CN-122094826-A | Method for producing laminate and method for separating CO2 | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122094772-A | Method for producing laminated film, and method for separating CO2 | — | 2026-05-26 | — | — | CN | disclosed |
| EP-4621487-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING CURCUMIN DERIVATIVE | Nissan Chemical Corporation (JP) | 2025-09-24 | — | — | EP | disclosed |
| WO-2025121034-A1 | RESIN COMPOSITION, MODIFIED RESIN COMPOSITION, AND METHOD FOR PRODUCING MODIFIED RESIN COMPOSITION | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| WO-2025120878-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE COLORING COMPOSITION, AND COLOR FILTER | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| WO-2025121033-A1 | METHOD FOR PRODUCING COPOLYMER | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| WO-2025121031-A1 | COPOLYMER | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| US-20010041769-A1 | Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1142928-A1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR Corporation (JP) | 2001-10-10 | — | — | EP | disclosed |
| EP-0634696-B2 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-31 | — | — | EP | disclosed |
| US-6114086-A | COMPRISING ALKALI-SOLUBLE RESIN, DISSOLUTION CONTROLLING AGENTS, PHOTOACID GENERATOR, SOLVENT; USED FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES OR INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2000-09-05 | — | — | US | disclosed |
| US-5916729-A | A POSITIVE TONE TYPE REISTS CONSISTS OF A RESIN WHICH HAS AN ACIDIC FUNCTIONAL GROUP PROTECTED BY AN ACID DECOMPOSABLE GROUP AND IS HYDROLYZABLE, A PHOTOACID GENERATOR AND A SOLVENT MIXTURE OF ALKYL LACTATE WITH PROPYLENE GLYCOL ETHER | JSR CORPORATION (JP) | 1999-06-29 | — | — | US | disclosed |
| EP-0634696-B1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5629135-A | ALKALI-SOLUBLE RESIN, CROSSLINKER, PHOTOACID GENERATOR, SOLVENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-13 | — | — | US | disclosed |
| EP-0634696-A1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |