SCHEMBL15745514

SCHEMBL15745514

CCC(C)(C)C(=O)OC(C)OC12CC3CC(C1)OC(=O)C(C3)C2

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL107043 0.85 NAAA (0.38) NAAA
SCHEMBL107056 0.83 CYP19A1 (0.35)
SCHEMBL12287484 0.82 TSHR (0.34) NAAA
SCHEMBL12287438 0.82 CYP17A1 (0.31) NAAA
SCHEMBL15745513 0.82 TSHR (0.32) NAAA
SCHEMBL12287754 0.81 TSHR (0.33) NAAA
SCHEMBL12284606 0.81 TSHR (0.33) NAAA
SCHEMBL12287511 0.81 NAAA (0.33) NAAA
SCHEMBL17589063 0.81 MEN1 (0.31) NAAA
SCHEMBL12285390 0.81 NAAA (0.30) NAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9128374-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-09-08 US disclosed
US-20140147790-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2014-05-29 US disclosed