SCHEMBL15765700

SCHEMBL15765700

CCC[Si](C)(C)OC(C)(CC)[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18911136 1.00
SCHEMBL16656614 0.84
SCHEMBL15028877 0.84
SCHEMBL14905900 0.80
SCHEMBL15062043 0.79
SCHEMBL15385087 0.78
SCHEMBL5949901 0.74
SCHEMBL15848892 0.72
SCHEMBL17029676 0.72
Ammonia Solution, Strong SCHEMBL27784727 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9646868-B2 Wafer temporary bonding method and thin wafer manufacturing method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-09 US disclosed
US-20170069521-A1 WAFER PROCESSING LAMINATE, TEMPORARY ADHESIVE MATERIAL FOR WAFER PROCESSING, AND METHOD FOR MANUFACTURING THIN WAFER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-09 US disclosed
EP-3112434-A1 WAFER PROCESSING TEMPORARY BONDING ARRANGEMENT, WAFER PROCESSING LAMINATE, AND THIN WAFER MANUFACTURING METHOD Shin-Etsu Chemical Co., Ltd. (JP) 2017-01-04 EP disclosed
US-9487693-B2 Chromene compound TOKUYAMA CORPORATION (JP) 2016-11-08 US disclosed
US-9235144-B2 Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2016-01-12 US disclosed
US-8778236-B2 Chromene compound TOKUYAMA CORPORATION (JP) 2014-07-15 US disclosed
US-20140154527-A1 CHROMENE COMPOUND TOKUYAMA CORPORATION (JP) 2014-06-05 US disclosed