SCHEMBL15767253

SCHEMBL15767253

CCCCCCCCCC([O])C#N

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LCK P06239 1/20 0.43
PPARD Q03181 1/20 0.43
ZDHHC20 Q5W0Z9 1/20 0.43
ZDHHC2 Q9UIJ5 1/20 0.43
GPR84 Q9NQS5 5/20 0.40
FDPS P14324 3/20 0.40
TSHR P16473 2/20 0.40
FFAR1 O14842 1/20 0.40
ZDHHC7 Q9NXF8 1/20 0.39
LMNA P02545 1/20 0.39
MAPT P10636 1/20 0.39
DNM1 Q05193 1/20 0.39
THRB P10828 1/20 0.38
ADH1B P00325 1/20 0.38
ADH1C P00326 1/20 0.38
ADH1A P07327 1/20 0.38
ADH4 P08319 1/20 0.38
ADH7 P40394 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10843455 1.00 LCK (0.43) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL10844501 1.00 LCK (0.43) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL15767037 1.00 LCK (0.43) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL2299755 0.98
SCHEMBL2296134 0.90
SCHEMBL11546510 0.79 TSHR (0.45) ZDHHC20TSHRMAPTTHRB
SCHEMBL24044418 0.77 TSHR (0.46) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL985792 0.77 TSHR (0.46) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL13601912 0.77 TSHR (0.46) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL12844942 0.77 TSHR (0.46) LCKPPARDZDHHC20ZDHHC2GPR84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11320739-B2 Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate JSR CORPORATION (JP) 2022-05-03 US claimed
US-11320739-B2 Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate JSR CORPORATION (JP) 2022-05-03 US disclosed
US-20180348633-A1 COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND METHOD FOR PRODUCING PATTERNED SUBSTRATE JSR CORPORATION (JP) 2018-12-06 US disclosed
US-9040516-B2 Uracil derivative and use thereof for medical purposes SUMITOMO DAINIPPON PHARMA CO., LTD. (JP) 2015-05-26 US disclosed
US-20140179670-A1 URACIL DERIVATIVE AND USE THEREOF FOR MEDICAL PURPOSES DAINIPPON SUMITOMO PHARMA CO., LTD. (JP) 2014-06-26 US disclosed
EP-2740728-A1 URACIL DERIVATIVE AND USE THEREOF FOR MEDICAL PURPOSES Dainippon Sumitomo Pharma Co., Ltd. (JP) 2014-06-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20140179670-A1 URACIL DERIVATIVE AND USE THEREOF FOR MEDICAL PURPOSES URB2, ELANE, NUDT1 LCK 4495/4885PPARD 1632/4885ZDHHC20 2722/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.