Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.56 |
| ▸ | MAOA | P21397 | 1/20 | 0.51 |
| ▸ | MAOB | P27338 | 1/20 | 0.51 |
| ▸ | MAPT | P10636 | 6/20 | 0.51 |
| ▸ | NPC1 | O15118 | 3/20 | 0.51 |
| ▸ | RAB9A | P51151 | 3/20 | 0.51 |
| ▸ | HPGD | P15428 | 2/20 | 0.51 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.51 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.51 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | MEN1 | O00255 | 3/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | POLB | P06746 | 2/20 | 0.44 |
| ▸ | GAA | P10253 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.44 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4603602 | 0.85 | KDM4E (0.54) | KDM4EMAOAMAOBMAPTNPC1 | |
| SCHEMBL3657955 | 0.83 | MAOB (0.56) | KDM4EMAOAMAOBMAPTNPC1 | |
| SCHEMBL151907 | 0.82 | KDM4E (0.54) | KDM4EMAOAMAOBMAPTNPC1 | |
| SCHEMBL29740088 | 0.82 | KDM4E (0.54) | KDM4EMAOAMAOBMAPTNPC1 | |
| SCHEMBL8098759 | 0.81 | MAOB (0.57) | KDM4EMAOAMAOBMAPTNPC1 | |
| SCHEMBL2472914 | 0.81 | KDM4E (0.57) | KDM4EMAOAMAOBMAPTNPC1 | |
| SCHEMBL4634508 | 0.80 | KDM4E (0.49) | KDM4EMAOAMAOBMAPTNPC1 | |
| SCHEMBL21200860 | 0.80 | NPC1 (0.72) | KDM4EMAOAMAOBMAPTNPC1 | |
| SCHEMBL20448784 | 0.80 | MAPT (0.49) | KDM4EMAOAMAOBMAPTNPC1 | |
| SCHEMBL8716821 | 0.80 | MAPT (0.49) | KDM4EMAOAMAOBMAPTNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 140 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122080620-A | Low-shrinkage photo-curing elastic resin composition based on synergistic compensation and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-119264336-A | Polybutadiene acrylate photosensitive resin composition with self-healing property and application thereof in 405nm photocuring 3D printing | 福建农林大学 | 2025-01-07 | — | — | CN | claimed |
| CN-118459686-A | Photosensitive resin composition based on polybutadiene polyurethane acrylate and application of photosensitive resin composition in 405nm photocuring 3D printing | 泉州师范学院 | 2024-08-09 | — | — | CN | claimed |
| CN-118192169-A | Photo-thermal curing 3D printing photosensitive resin composition and printing method thereof at 405nm | 杭州喜马拉雅信息科技有限公司 | 2024-06-14 | — | — | CN | claimed |
| CN-117866149-A | Photosensitive resin composition based on ionic liquid and application of photosensitive resin composition in 405nm3D printing | 福州大学 | 2024-04-12 | — | — | CN | claimed |
| CN-117844234-A | Resin composition based on PSS-PEDOT waterborne polyurethane acrylate and application thereof | 泉州师范学院 | 2024-04-09 | — | — | CN | claimed |
| CN-115197375-B | Photosensitive resin composition suitable for 3D printing transparent elastomer and preparation method thereof | 材翼新材料科技(苏州)有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-117720687-A | Repairable polyurethane photosensitive resin composition and application thereof in 405nm photocuring 3D printing | 泉州师范学院 | 2024-03-19 | — | — | CN | claimed |
| CN-117586621-A | Silicon chain-containing acrylic liquid crystal photosensitive resin composition and application thereof in 3D printing | 泉州师范学院 | 2024-02-23 | — | — | CN | claimed |
| CN-117551238-A | Photo-curable 3D printing orientation acrylic-based liquid crystal photosensitive resin composition | 泉州师范学院 | 2024-02-13 | — | — | CN | claimed |
| CN-114773788-A | Photosensitive resin composition based on nano silicon rubber core-shell structure polymer toughened epoxy resin and application of photosensitive resin composition in 3D printing | 泉州师范学院 | 2022-07-22 | — | — | CN | claimed |
| CN-113831461-A | Bismaleimide/acrylic acid liquid crystal photosensitive resin-based composition and application thereof in 405nm3D printing | 泉州师范学院 | 2021-12-24 | — | — | CN | claimed |
| CN-113736217-A | Composition based on liquid crystal epoxy photosensitive resin and application of composition in 355nm3D printing | 泉州师范学院 | 2021-12-03 | — | — | CN | claimed |
| CN-113651920-A | Composition based on acrylic liquid crystal photosensitive resin and application thereof in 405nm 3D printing | 泉州师范学院 | 2021-11-16 | — | — | CN | claimed |
| CN-109867915-B | Photosensitive resin composition based on cardanol and application of photosensitive resin composition in 355nm3D printing | 泉州师范学院 | 2021-08-06 | — | — | CN | claimed |
| CN-113105590-A | Photosensitive resin composition for photocuring 3D printing elastomer and preparation method thereof | 泉州师范学院 | 2021-07-13 | — | — | CN | claimed |
| CN-113045709-A | Photosensitive resin composition for photocuring 3D printing high-toughness product and preparation method thereof | 泉州师范学院 | 2021-06-29 | — | — | CN | claimed |
| CN-112646085-A | Bismaleimide resin-based photosensitive resin composition and application thereof in 405nm 3D printing | 泉州师范学院 | 2021-04-13 | — | — | CN | claimed |
| CN-109836537-B | Photosensitive resin composition based on cardanol and application of photosensitive resin composition in 405nm 3D printing | 泉州师范学院 | 2021-04-09 | — | — | CN | claimed |
| CN-112029042-A | Photosensitive material for 3D printing and preparation method thereof | 河源然生新材料有限公司 | 2020-12-04 | — | — | CN | claimed |