SCHEMBL15869210

SCHEMBL15869210

Cc1cc(C2(c3ccc(OC(C)(C)C)c(C)c3)c3ccccc3-c3ccccc32)ccc1OC(C)(C)C

nearest known ligand 0.56

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.56
ESR2 Q92731 1/20 0.56
MEN1 O00255 4/20 0.41
KMT2A Q03164 4/20 0.41
LMNA P02545 3/20 0.41
MAPT P10636 3/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
KDM4E B2RXH2 1/20 0.41
OPRK1 P41145 1/20 0.41
POLB P06746 2/20 0.34
XBP1 P17861 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
PDK2 Q15119 7/20 0.32
CHRM5 P08912 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22416789 0.94 ESR1 (0.51) ESR1ESR2MEN1KMT2ALMNA
SCHEMBL21075509 0.89 ESR1 (0.49) ESR1ESR2MEN1KMT2ALMNA
SCHEMBL18415977 0.83 ESR1 (0.61) ESR1ESR2MEN1KMT2ALMNA
SCHEMBL8984548 0.78 ESR1 (0.73) ESR1ESR2MEN1KMT2ALMNA
SCHEMBL30446197 0.78 ESR1 (0.73) ESR1ESR2MEN1KMT2ALMNA
SCHEMBL4262501 0.78 ESR1 (0.55) ESR1ESR2MEN1KMT2ALMNA
SCHEMBL29489127 0.78 ESR1 (0.55) ESR1ESR2MEN1KMT2ALMNA
SCHEMBL26983396 0.78 ESR1 (0.59) ESR1ESR2MEN1KMT2ALMNA
SCHEMBL4131849 0.78 ESR1 (0.55) ESR1ESR2MEN1KMT2ALMNA
SCHEMBL18648958 0.77 ESR1 (0.45) ESR1ESR2MEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 US disclosed
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 US disclosed