SCHEMBL15910811

SCHEMBL15910811

Cc1c(O)cc2c(ccc3ccccc32)c1C

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HSD17B10 Q99714 4/20 0.50
▸ TSHR P16473 3/20 0.50
▸ HPGD P15428 3/20 0.50
▸ HIF1A Q16665 2/20 0.50
▸ CYP3A4 P08684 1/20 0.50
▸ MAPK1 P28482 1/20 0.50
▸ CASP1 P29466 1/20 0.50
▸ RAB9A P51151 1/20 0.50
▸ CASP7 P55210 1/20 0.50
▸ ATM Q13315 1/20 0.50
▸ L3MBTL1 Q9Y468 1/20 0.50
▸ HPRT1 P00492 3/20 0.48
▸ ALDH1A1 P00352 5/20 0.46
▸ CYP1A2 P05177 5/20 0.46
▸ CYP2A6 P11509 2/20 0.46
▸ MAPT P10636 2/20 0.46
▸ TDP1 Q9NUW8 1/20 0.46
▸ LCK P06239 1/20 0.46
▸ FYN P06241 1/20 0.46
▸ ADORA3 P0DMS8 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL599072 0.80 CYP1A2 (0.54) HSD17B10TSHRHPGDHIF1ACYP3A4
SCHEMBL30940352 0.79 TRPM4 (0.58) HSD17B10TSHRHPGDHIF1AALDH1A1
SCHEMBL29815165 0.79 TRPM4 (0.71) HSD17B10TSHRHIF1AHPRT1ALDH1A1
SCHEMBL8288093 0.79 TRPM4 (0.71) HSD17B10TSHRHIF1AHPRT1ALDH1A1
SCHEMBL11225791 0.79 TRPM4 (0.58) HSD17B10TSHRHPGDHIF1AALDH1A1
SCHEMBL28513236 0.78 HPRT1 (0.56) HSD17B10TSHRHPGDHIF1ACYP3A4
SCHEMBL28526737 0.78 CYP1A2 (0.52) HSD17B10TSHRHPGDHIF1ACYP3A4
SCHEMBL27479472 0.78 TRPM4 (0.57) HSD17B10TSHRHPGDHIF1AHPRT1
SCHEMBL27994596 0.78 HPRT1 (0.50) HSD17B10TSHRHPGDHIF1AHPRT1
SCHEMBL1760677 0.78 ALDH1A1 (0.62) HSD17B10TSHRHPGDHIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140246400-A1 RESIN HAVING FLUORENE STRUCTURE AND MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-09-04 — — US claimed
EP-2762513-A1 RESIN HAVING FLUORENE STRUCTURE AND UNDERLAYER FILM-FORMING MATERIAL FOR LITHOGRAPHY Mitsubishi Gas Chemical Company, Inc. (JP) 2014-08-06 — — EP claimed
US-20140246400-A1 RESIN HAVING FLUORENE STRUCTURE AND MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-09-04 — — US disclosed
EP-2762513-A1 RESIN HAVING FLUORENE STRUCTURE AND UNDERLAYER FILM-FORMING MATERIAL FOR LITHOGRAPHY Mitsubishi Gas Chemical Company, Inc. (JP) 2014-08-06 — — EP disclosed
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