SCHEMBL15914499

SCHEMBL15914499

[SiH3]C1(C2CCCCC2)CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.30
TSHR P16473 1/20 0.30
KDM4E B2RXH2 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15915149 1.00 LMNA (0.30) LMNATSHRKDM4EMAPT
SCHEMBL15914464 1.00 LMNA (0.30) LMNATSHRKDM4EMAPT
SCHEMBL28809069 0.85
SCHEMBL15749797 0.79
SCHEMBL8852722 0.69 LMNA (0.32) LMNATSHRKDM4EMAPT
SCHEMBL4697737 0.69 SCN1A (0.41) LMNATSHRKDM4EMAPT
SCHEMBL2993610 0.69 SCN1A (0.41) LMNATSHRKDM4EMAPT
SCHEMBL4655278 0.69 SCN1A (0.41) LMNATSHRKDM4EMAPT
SCHEMBL181178 0.69 SCN1A (0.41) LMNATSHRKDM4EMAPT
SCHEMBL30492082 0.69 SCN1A (0.41) LMNATSHRKDM4EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed