SCHEMBL15915213

SCHEMBL15915213

CCCC[SiH](CCCC)C(C)CC

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.33
LMNA P02545 1/20 0.33
TRPM8 Q7Z2W7 5/20 0.32
OPRM1 P35372 1/20 0.32
THRB P10828 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15915300 0.89 TSHR (0.42) TSHRLMNATRPM8OPRM1THRB
SCHEMBL15915164 0.81 TSHR (0.32) TSHR
SCHEMBL15915163 0.80 TSHR (0.32) TSHRLMNATRPM8OPRM1THRB
SCHEMBL4386834 0.79 TSHR (0.35) TSHRLMNAOPRM1THRB
SCHEMBL23701152 0.76
SCHEMBL23700986 0.76
SCHEMBL23701233 0.76
SCHEMBL2271551 0.76
SCHEMBL10348395 0.74 OPRM1 (0.42) TSHRLMNAOPRM1THRB
SCHEMBL9490559 0.74 OPRM1 (0.42) TSHRLMNAOPRM1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
CN-103781937-B Filmogen, the diaphragm seal using the filmogen, and application thereof 东曹株式会社 2017-05-31 CN disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed
CN-103781937-A Film-forming material, sealing film using same, and use of sealing film TOSOH CORP 2014-05-07 CN disclosed