SCHEMBL15915515

SCHEMBL15915515

CCC(C)[Si](C1CCCC1)(C1CCCC1)C1CCCC1

nearest known ligand 0.37

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.37
KDM4E B2RXH2 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15915536 0.98 SHBG (0.41) SHBGKDM4E
SCHEMBL15915499 0.80 SHBG (0.37) SHBG
SCHEMBL3892339 0.78 SHBG (0.41) SHBG
SCHEMBL15916066 0.75 SHBG (0.33) SHBG
SCHEMBL15915027 0.75 SHBG (0.33) SHBG
SCHEMBL27564122 0.73 KDM4E (0.32) SHBGKDM4E
SCHEMBL15915444 0.73 SHBG (0.37) SHBG
SCHEMBL15915255 0.73 SHBG (0.37) SHBG
SCHEMBL17886080 0.73
SCHEMBL3889060 0.69 SHBG (0.33) SHBG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed