SCHEMBL15915908

SCHEMBL15915908

CCC(C)[SiH](CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2271333 0.81
SCHEMBL2272580 0.78
SCHEMBL2271900 0.76
SCHEMBL2267458 0.74 TP53 (0.33)
SCHEMBL2271553 0.74
SCHEMBL5711225 0.74 TSHR (0.33)
SCHEMBL29094 0.72
SCHEMBL440207 0.72 TSHR (0.38)
SCHEMBL15914997 0.72 TSHR (0.32)
SCHEMBL15915164 0.72 TSHR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113906036-B Polycyclic aromatic compound, material for organic device, organic electroluminescent element, display device, and lighting device 学校法人关西学院 2024-10-25 CN disclosed
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
CN-103781937-B Filmogen, the diaphragm seal using the filmogen, and application thereof 东曹株式会社 2017-05-31 CN disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed
CN-103781937-A Film-forming material, sealing film using same, and use of sealing film TOSOH CORP 2014-05-07 CN disclosed
CN-103154007-A Anthra[2,3-b:7,6b']dithiophene derivatives and their use as organic semiconductors MERCK PATENT GMBH 2013-06-12 CN disclosed