SCHEMBL1592292

SCHEMBL1592292

CC(C=CC(=O)O)CC=CC(=O)O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRP O00591 2/20 0.48
GABRD O14764 2/20 0.48
GABRA1 P14867 2/20 0.48
GABRB1 P18505 2/20 0.48
GABRG2 P18507 2/20 0.48
GABRB3 P28472 2/20 0.48
GABRA5 P31644 2/20 0.48
GABRA3 P34903 2/20 0.48
GABRA2 P47869 2/20 0.48
GABRB2 P47870 2/20 0.48
GABRA4 P48169 2/20 0.48
GABRE P78334 2/20 0.48
GABRA6 Q16445 2/20 0.48
GABRG1 Q8N1C3 2/20 0.48
GABRG3 Q99928 2/20 0.48
GABRQ Q9UN88 2/20 0.48
TSHR P16473 3/20 0.41
GABRR1 P24046 2/20 0.41
GABRR2 P28476 2/20 0.41
BLM P54132 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL29666699 0.84 GABRP (0.36) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL21180891 0.82 GABRP (0.36) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL28920813 0.82 TSHR (0.41) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL15641374 0.80 GABRP (0.46) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL15641375 0.80 GABRP (0.46) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL2571773 0.78 GABRP (0.45) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL6570484 0.78 GABRP (0.45) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL12973059 0.78
SCHEMBL15353 0.78
SCHEMBL15352 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10510971-B2 Vapor-deposited nanoscale ionic liquid gels as gate insulators for low-voltage high-speed thin film transistors MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2019-12-17 US claimed
US-20190131554-A1 VAPOR-DEPOSITED NANOSCALE IONIC LIQUID GELS AS GATE INSULATORS FOR LOW-VOLTAGE HIGH-SPEED THIN FILM TRANSISTORS NAVY, SECRETARY OF THE UNITED STATES OF AMERICA 2019-05-02 US claimed
WO-2019032253-A1 VAPOR-DEPOSITED NANOSCALE IONIC LIQUID GELS AS GATE INSULATORS FOR LOW-VOLTAGE HIGH-SPEED THIN FILM TRANSISTORS MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2019-02-14 WO claimed
US-8673536-B2 Photosensitive polymeric networks Helmholtz-Zentrum Geesthacht Zentrum fuer Material und Kuesten forschung GmbH (DE) 2014-03-18 US claimed
US-8309281-B2 Photosensitive polymeric networks Helmholtz-Zentrum Geesthacht Zentrum feur Material und Kuesten forschung GmbH (DE) 2012-11-13 US claimed
US-20110092609-A1 PHOTOSENSITIVE POLYMERIC NETWORKS GKSS FORSCHUNGSZENTRUM GEESTHACHT GMBH (DE) 2011-04-21 US claimed
US-10510971-B2 Vapor-deposited nanoscale ionic liquid gels as gate insulators for low-voltage high-speed thin film transistors MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2019-12-17 US disclosed
US-20190131554-A1 VAPOR-DEPOSITED NANOSCALE IONIC LIQUID GELS AS GATE INSULATORS FOR LOW-VOLTAGE HIGH-SPEED THIN FILM TRANSISTORS NAVY, SECRETARY OF THE UNITED STATES OF AMERICA 2019-05-02 US disclosed
WO-2019032253-A1 VAPOR-DEPOSITED NANOSCALE IONIC LIQUID GELS AS GATE INSULATORS FOR LOW-VOLTAGE HIGH-SPEED THIN FILM TRANSISTORS MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2019-02-14 WO disclosed
CN-105556624-A Embedded multilayer ceramic capacitor and method for manufacturing embedded multilayer ceramic capacitor SHIN YU SEON 2016-05-04 CN disclosed
US-8673536-B2 Photosensitive polymeric networks Helmholtz-Zentrum Geesthacht Zentrum fuer Material und Kuesten forschung GmbH (DE) 2014-03-18 US disclosed
US-20130109262-A1 COATED POROUS MATERIALS 3M INNOVATIVE PROPERTIES COMPANY (US) 2013-05-02 US disclosed
US-8313651-B2 Membrane stacks NATRIX SEPARATIONS INC. (CA) 2012-11-20 US disclosed
US-7316919-B2 Composite materials comprising supported porous gels NYSA MEMBRANE TECHNOLOGIES (CA) 2008-01-08 US disclosed
US-20060257629-A1 Photosensitive polymeric networks MNEMOSCIENCE GMBH (GB) 2006-11-16 US disclosed
US-20040203149-A1 Composite materials comprising supported porous gels MERCK MILLIPORE LTD. (IE) 2004-10-14 US disclosed
EP-0896968-A1 MODIFIED COPOLYMER, PROCESS FOR PREPARING THE SAME, AND CURABLE RESIN COMPOSITION DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) 1999-02-17 EP disclosed
EP-0405216-B1 Rubber composition containing a sulfur-modified polychloroprene gel BAYER AG (DE) 1994-12-14 EP disclosed
EP-0533015-A1 New sulfur modified butadiene copolymers containing functional groups and mixtures thereof with other rubbers BAYER AG (DE) 1993-03-24 EP disclosed
EP-0405216-A1 Rubber composition containing a sulfur-modified polychloroprene gel BAYER AG (DE) 1991-01-02 EP disclosed