Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC8 | Q9BY41 | 3/20 | 0.60 |
| ▸ | HDAC6 | Q9UBN7 | 3/20 | 0.60 |
| ▸ | STAT3 | P40763 | 1/20 | 0.60 |
| ▸ | F3 | P13726 | 2/20 | 0.57 |
| ▸ | MAOB | P27338 | 4/20 | 0.56 |
| ▸ | THRB | P10828 | 1/20 | 0.56 |
| ▸ | ATM | Q13315 | 1/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.55 |
| ▸ | MEN1 | O00255 | 2/20 | 0.55 |
| ▸ | NPC1 | O15118 | 1/20 | 0.55 |
| ▸ | LMNA | P02545 | 1/20 | 0.55 |
| ▸ | RAB9A | P51151 | 1/20 | 0.55 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.55 |
| ▸ | MAOA | P21397 | 1/20 | 0.55 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.55 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.55 |
| ▸ | GSK3B | P49841 | 2/20 | 0.54 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.53 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7771631 | 0.88 | KMT2A (0.69) | HDAC8HDAC6F3MAOBTHRB | |
| SCHEMBL7771632 | 0.88 | KMT2A (0.69) | HDAC8HDAC6F3MAOBTHRB | |
| SCHEMBL15929625 | 0.82 | MAOB (0.55) | MAOBKMT2AALDH1A1NPC1LMNA | |
| SCHEMBL1231600 | 0.81 | THRB (0.77) | HDAC8HDAC6STAT3F3MAOB | |
| SCHEMBL2026112 | 0.81 | HDAC8 (0.65) | HDAC8HDAC6STAT3F3MAOB | |
| SCHEMBL1231605 | 0.81 | THRB (0.77) | HDAC8HDAC6STAT3F3MAOB | |
| SCHEMBL2026113 | 0.81 | HDAC8 (0.65) | HDAC8HDAC6STAT3F3MAOB | |
| SCHEMBL25307242 | 0.80 | THRB (0.74) | HDAC8HDAC6STAT3F3MAOB | |
| SCHEMBL21428246 | 0.80 | HDAC8 (0.68) | HDAC8HDAC6STAT3F3MAOB | |
| SCHEMBL16410058 | 0.80 | HDAC8 (0.63) | HDAC8HDAC6STAT3F3MAOB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10551745-B2 | Photopatternable compositions and methods of fabricating transistor devices using same | FLEXTERRA, INC. (US) | 2020-02-04 | — | — | US | disclosed |
| US-20170227846-A1 | Photopatternable Compositions and Methods of Fabricating Transistor Devices Using Same | USINVEST LLC | 2017-08-10 | — | — | US | disclosed |
| US-20170227846-A1 | Photopatternable Compositions and Methods of Fabricating Transistor Devices Using Same | USINVEST LLC | 2017-08-10 | — | — | US | disclosed |
| US-9704997-B2 | Photopatternable materials and related electronic devices and methods | FLEXTERRA, INC. (US) | 2017-07-11 | — | — | US | disclosed |
| US-9704997-B2 | Photopatternable materials and related electronic devices and methods | FLEXTERRA, INC. (US) | 2017-07-11 | — | — | US | disclosed |
| US-20170104080-A1 | Curable Polymeric Materials and Their Use for Fabricating Electronic Devices | USINVEST LLC | 2017-04-13 | — | — | US | disclosed |
| US-20170104080-A1 | Curable Polymeric Materials and Their Use for Fabricating Electronic Devices | USINVEST LLC | 2017-04-13 | — | — | US | disclosed |
| US-20160190337-A1 | Photopatternable Materials and Related Electronic Devices and Methods | USINVEST LLC | 2016-06-30 | — | — | US | disclosed |
| US-9190493-B2 | Photopatternable materials and related electronic devices and methods | POLYERA CORPORATION (US) | 2015-11-17 | — | — | US | disclosed |
| US-9035287-B2 | Polymeric materials for use in metal-oxide-semiconductor field-effect transistors | POLYERA CORPORATION (US) | 2015-05-19 | — | — | US | disclosed |
| US-20150021597-A1 | Photopatternable Materials and Related Electronic Devices and Methods | USINVEST LLC | 2015-01-22 | — | — | US | disclosed |
| US-20140217395-A1 | Polymeric Materials for Use in Metal-Oxide-Semiconductor Field-Effect Transistors | POLYERA CORPORATION (US) | 2014-08-07 | — | — | US | disclosed |