Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 3/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.33 |
| ▸ | CASP6 | P55212 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4403786 | 0.86 | MAPK1 (0.40) | ALDH1A1KDM4EHPGDHSD17B10ATM | |
| SCHEMBL15934940 | 0.85 | KDM4E (0.40) | ALDH1A1KDM4EHPGDHSD17B10POLB | |
| SCHEMBL15146979 | 0.82 | ATM (0.35) | ALDH1A1KDM4EHPGDHSD17B10ATM | |
| SCHEMBL786634 | 0.81 | ATM (0.41) | ALDH1A1KDM4EHPGDHSD17B10ATM | |
| SCHEMBL10099524 | 0.79 | CYP1A2 (0.34) | ALDH1A1KDM4EHPGDHSD17B10ATM | |
| SCHEMBL15147077 | 0.78 | ALDH1A1 (0.36) | ALDH1A1KDM4EHPGDHSD17B10ATM | |
| SCHEMBL15147040 | 0.77 | ALDH1A1 (0.35) | ALDH1A1KDM4EHPGDHSD17B10ATM | |
| SCHEMBL15219195 | 0.75 | KDM4E (0.40) | ALDH1A1KDM4EHPGDHSD17B10POLB | |
| SCHEMBL25990997 | 0.75 | MAPK1 (0.45) | ALDH1A1KDM4EHPGDHSD17B10POLB | |
| SCHEMBL15147108 | 0.75 | POLB (0.32) | ALDH1A1KDM4EHPGDHSD17B10ATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20140220492-A1 | RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-07 | — | — | US | disclosed |