SCHEMBL15935641

SCHEMBL15935641

CCCOCCSc1c[nH]c2ccccc12

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
STAT3 P40763 2/20 0.53
HSD17B10 Q99714 1/20 0.53
GFER P55789 2/20 0.49
POLB P06746 1/20 0.49
MAPT P10636 6/20 0.46
TUBB4A P04350 1/20 0.44
TUBB P07437 1/20 0.44
TUBA3C P0DPH7 1/20 0.44
TUBA1B P68363 1/20 0.44
TUBA4A P68366 1/20 0.44
TUBB4B P68371 1/20 0.44
TUBB3 Q13509 1/20 0.44
TUBB2A Q13885 1/20 0.44
TUBB8 Q3ZCM7 1/20 0.44
TUBA3E Q6PEY2 1/20 0.44
TUBA1A Q71U36 1/20 0.44
TUBA1C Q9BQE3 1/20 0.44
TUBB6 Q9BUF5 1/20 0.44
TUBB2B Q9BVA1 1/20 0.44
TUBB1 Q9H4B7 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14418732 0.81 STAT3 (0.58) STAT3HSD17B10GFERPOLBMAPT
SCHEMBL11382070 0.81 STAT3 (0.58) STAT3HSD17B10GFERPOLBMAPT
SCHEMBL30897295 0.81 STAT3 (0.58) STAT3HSD17B10GFERPOLBMAPT
SCHEMBL2364045 0.80 STAT3 (0.57) STAT3HSD17B10GFERPOLBMAPT
SCHEMBL8115720 0.74 STAT3 (0.59) STAT3HSD17B10GFERPOLBMAPT
SCHEMBL9514779 0.74 STAT3 (0.59) STAT3HSD17B10GFERPOLBMAPT
SCHEMBL10854182 0.74 MAPT (0.56) STAT3HSD17B10GFERPOLBMAPT
Hydrochloric Acid SCHEMBL10681278 0.73 STAT3 (0.58) STAT3HSD17B10GFERPOLBMAPT
SCHEMBL13134305 0.72 STAT3 (0.53) STAT3HSD17B10GFERPOLBMAPT
SCHEMBL10850355 0.72 STAT3 (0.53) STAT3HSD17B10GFERPOLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2014119698-A1 PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-08-07 WO disclosed