Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGKA | P23743 | 1/20 | 0.55 |
| ▸ | LMNA | P02545 | 2/20 | 0.52 |
| ▸ | PAM | P19021 | 2/20 | 0.50 |
| ▸ | MAPT | P10636 | 2/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.48 |
| ▸ | CES2 | O00748 | 3/20 | 0.48 |
| ▸ | CES1 | P23141 | 3/20 | 0.48 |
| ▸ | CA12 | O43570 | 1/20 | 0.47 |
| ▸ | CA2 | P00918 | 1/20 | 0.47 |
| ▸ | CA7 | P43166 | 1/20 | 0.47 |
| ▸ | CA9 | Q16790 | 1/20 | 0.47 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 4/20 | 0.47 |
| ▸ | PPARG | P37231 | 5/20 | 0.46 |
| ▸ | PPARD | Q03181 | 5/20 | 0.46 |
| ▸ | PPARA | Q07869 | 5/20 | 0.46 |
| ▸ | HDAC11 | Q96DB2 | 4/20 | 0.46 |
| ▸ | GPR84 | Q9NQS5 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | TLR2 | O60603 | 2/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6689556 | 1.00 | DGKA (0.55) | DGKALMNAPAMMAPTMAPK1 | |
| SCHEMBL3762292 | 1.00 | DGKA (0.55) | DGKALMNAPAMMAPTMAPK1 | |
| SCHEMBL339526 | 1.00 | DGKA (0.55) | DGKALMNAPAMMAPTMAPK1 | |
| SCHEMBL6688849 | 1.00 | DGKA (0.55) | DGKALMNAPAMMAPTMAPK1 | |
| SCHEMBL3846923 | 1.00 | DGKA (0.55) | DGKALMNAPAMMAPTMAPK1 | |
| SCHEMBL1827580 | 1.00 | DGKA (0.55) | DGKALMNAPAMMAPTMAPK1 | |
| SCHEMBL5431993 | 1.00 | DGKA (0.55) | DGKALMNAPAMMAPTMAPK1 | |
| SCHEMBL2464653 | 1.00 | DGKA (0.55) | DGKALMNAPAMMAPTMAPK1 | |
| SCHEMBL1445754 | 1.00 | DGKA (0.55) | DGKALMNAPAMMAPTMAPK1 | |
| Octane SCHEMBL27910076 | 1.00 | DGKA (0.55) | DGKALMNAPAMMAPTMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11531269-B2 | Method for producing resist pattern coating composition with use of solvent replacement method | NISSAN CHEMICAL CORPORATION (JP) | 2022-12-20 | — | — | US | disclosed |
| US-20220206395-A1 | COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS | NISSAN CHEMICAL CORPORATION (JP) | 2022-06-30 | — | — | US | disclosed |
| US-10558119-B2 | Composition for coating resist pattern | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-02-11 | — | — | US | disclosed |
| US-20190250512-A1 | METHOD FOR PRODUCING RESIST PATTERN COATING COMPOSITION WITH USE OF SOLVENT REPLACEMENT METHOD | NISSAN CHEMICAL CORPORATION (JP) | 2019-08-15 | — | — | US | disclosed |
| CN-109791376-A | The manufacturing method of the resist pattern coating composition of solvent displacement is used | 日产化学株式会社 | 2019-05-21 | — | — | CN | disclosed |
| US-20180149977-A1 | COMPOSITION FOR COATING RESIST PATTERN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-05-31 | — | — | US | disclosed |
| CN-107533302-A | Composition for coating resist pattern | 日产化学工业株式会社 | 2018-01-02 | — | — | CN | disclosed |
| US-8900472-B2 | Texturing and cleaning agent for the surface treatment of wafers and use thereof | Fraunhofer-Gesellschaft zur Föerderung der Angewandten Forschung E.V. (DE) | 2014-12-02 | — | — | US | disclosed |
| EP-2229431-B1 | TEXTURING AND CLEANING MEDIUM FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF | FRAUNHOFER GES FORSCHUNG (DE) | 2013-02-20 | — | — | EP | disclosed |
| US-20110092074-A1 | Texturing and cleaning agent for the surface treatment of wafers and use thereof | FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) | 2011-04-21 | — | — | US | disclosed |
| EP-2229431-A2 | TEXTURING AND CLEANING MEDIUM FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) | 2010-09-22 | — | — | EP | disclosed |
| WO-2009071333-A2 | TEXTURING AND CLEANING MEDIUM FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) | 2009-06-11 | — | — | WO | disclosed |