Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 1/20 | 0.49 |
| ▸ | NAAA | Q02083 | 2/20 | 0.47 |
| ▸ | HTT | P42858 | 2/20 | 0.46 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.44 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.36 |
| ▸ | CA12 | O43570 | 2/20 | 0.36 |
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 2/20 | 0.36 |
| ▸ | CA9 | Q16790 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.35 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | MIF | P14174 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17470137 | 1.00 | CYP2C19 (0.49) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL27615579 | 0.90 | — | — | |
| SCHEMBL6711347 | 0.83 | CYP2C19 (0.52) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL6650101 | 0.83 | CYP2C19 (0.52) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL21357996 | 0.82 | NAAA (0.33) | CYP2C19NAAAHTTCYP19A1 | |
| SCHEMBL28131502 | 0.82 | SMYD3 (0.33) | CYP2C19NAAAHTTCYP19A1 | |
| SCHEMBL3964894 | 0.82 | CYP2C19 (0.50) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL1378849 | 0.81 | NAAA (0.53) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL112347 | 0.81 | EPHX1 (0.41) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL25401219 | 0.80 | NAAA (0.51) | CYP2C19NAAAHTTCYP19A1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-3974196-A | Method for disproportionating ethylenically unsaturated compounds having functional ester groups | JAPAN SYNTHETIC RUBBER CO., LTD. (JA) | 1976-08-10 | — | — | US | claimed |
| US-7960476-B2 | Acrylic resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-06-14 | — | — | US | disclosed |
| US-20110091818-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-21 | — | — | US | disclosed |
| US-7585570-B2 | A curable adhesive comprising acrylic ester polymers, a polysilsesquioxane or polysilicate, and a disisocyanate crosslinking agent; liquid crystal displays; glass substrates; films; durability; antipeeling agents; haze-free, nonblistering; antifoam agents; resistant to repeated cycles of heating/cooling | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-09-08 | — | — | US | disclosed |
| US-20080131640-A1 | ACRYLIC RESIN COMPOSITION | KAWAMURA AKIRA | 2008-06-05 | — | — | US | disclosed |
| US-20060252863-A1 | A curable adhesive comprising acrylic ester polymers, a polysilsesquioxane or polysilicate, and a disisocyanate crosslinking agent; liquid crystal displays; glass substrates; films; durability; antipeeling agents; haze-free, nonblistering; antifoam agents; resistant to repeated cycles of heating/cooling | SUMITOMO CHEMICHAL COMPANY, LIMITED | 2006-11-09 | — | — | US | disclosed |
| US-20060036040-A1 | Adhesive | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-02-16 | — | — | US | disclosed |
| US-20050261433-A1 | Acrylic resin | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-11-24 | — | — | US | disclosed |
| US-20050244657-A1 | Acrylic resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2005-11-03 | — | — | US | disclosed |
| US-20050215743-A1 | Acrylic resin | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-09-29 | — | — | US | disclosed |
| JP-2000235263-A | POSITIVE TYPE RESIST COMPOSITION AND ACID DISSOCIABLE GROUP-CONTAINING MONOMER USED IN SAME | TOKYO OHKA KOGYO CO LTD | 2000-08-29 | — | — | JP | disclosed |
| US-5731383-A | USED FOR HIGH DENSITY POLYESTERS, POLYAMIDES, POLYUREAS, POLYURETHANES | AMOCO CORPORATION (US) | 1998-03-24 | — | — | US | disclosed |
| US-5589548-A | Process for preparing difunctional telechelic linear non-crosslinked polyolefins | AMOCO CORPORATION (US) | 1996-12-31 | — | — | US | disclosed |
| US-5559190-A | Difunctional telechelic linear non-crosslinked polyolefins | AMOCO CORPORATION (US) | 1996-09-24 | — | — | US | disclosed |
| US-5512635-A | OLEFIN METATHESIS PROCESS; CROSSLINKING INHIBITION | AMOCO CORPORATION (US) | 1996-04-30 | — | — | US | disclosed |
| US-5403904-A | Process for preparation of telechelic difunctional unsaturated oligomers or polymers by acyclic olefin metathesis | AMOCO CORPORATION (US) | 1995-04-04 | — | — | US | disclosed |
| EP-0626402-A2 | Process for preparing linear monofunctional and telechelic difunctional polymers and compositions obtained thereby | AMOCO CORPORATION (US) | 1994-11-30 | — | — | EP | disclosed |
| US-4770810-A | Organic compound having a smectic phase A, and a mixture comprising this compound | THOMSON-CSF (FR) | 1988-09-13 | — | — | US | disclosed |
| US-4217299-A | Method for converting unsaturated compound having functional group | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1980-08-12 | — | — | US | disclosed |
| US-3974196-A | Method for disproportionating ethylenically unsaturated compounds having functional ester groups | JAPAN SYNTHETIC RUBBER CO., LTD. (JA) | 1976-08-10 | — | — | US | disclosed |