⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28418153 | 1.00 | — | — | |
| SCHEMBL11609799 | 0.88 | — | — | |
| SCHEMBL1665274 | 0.87 | — | — | |
| SCHEMBL11611813 | 0.87 | — | — | |
| SCHEMBL11878583 | 0.84 | NPC1 (0.44) | — | |
| SCHEMBL220993 | 0.84 | — | — | |
| SCHEMBL11879705 | 0.84 | NPC1 (0.44) | — | |
| SCHEMBL6064183 | 0.80 | MEN1 (0.44) | — | |
| SCHEMBL29060993 | 0.80 | — | — | |
| SCHEMBL9367734 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8304163-B2 | Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-11-06 | — | — | US | disclosed |
| US-7943284-B2 | Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-17 | — | — | US | disclosed |
| US-20110091810-A1 | COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20090081580-A1 | COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD (JP) | 2009-03-26 | — | — | US | disclosed |
| EP-1862854-A1 | Decomposable composition and method for using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-12-05 | — | — | EP | disclosed |
| US-20070275328-A1 | Decomposable composition and method for using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |