⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11879705 | 0.97 | NPC1 (0.44) | — | |
| SCHEMBL11878583 | 0.97 | NPC1 (0.44) | — | |
| SCHEMBL220993 | 0.97 | — | — | |
| SCHEMBL11611813 | 0.94 | — | — | |
| SCHEMBL1593968 | 0.87 | — | — | |
| SCHEMBL28418153 | 0.87 | — | — | |
| SCHEMBL29060993 | 0.80 | — | — | |
| SCHEMBL11609799 | 0.77 | — | — | |
| SCHEMBL5379120 | 0.75 | NPC1 (0.52) | — | |
| SCHEMBL9367734 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260079398-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-03-19 | — | — | US | disclosed |
| CN-108368016-B | Process for producing cyclopentyl alkyl ether compound | 日本瑞翁株式会社 | 2023-09-26 | — | — | CN | disclosed |
| EP-3398928-B1 | METHOD FOR PRODUCING CYCLOPENTYL ALKYL ETHER COMPOUND | ZEON CORP (JP) | 2021-01-20 | — | — | EP | disclosed |
| US-20180354880-A1 | METHOD FOR PRODUCING CYCLOPENTYL ALKYL ETHER COMPOUND | ZEON CORPORATION (JP) | 2018-12-13 | — | — | US | disclosed |
| EP-3398928-A1 | METHOD FOR PRODUCING CYCLOPENTYL ALKYL ETHER COMPOUND | Zeon Corporation (JP) | 2018-11-07 | — | — | EP | disclosed |
| US-7919227-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-7919227-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-7919227-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20100040970-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20100040970-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20100040970-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-18 | — | — | US | disclosed |
| US-4859229-A | HERBICIDES | HOFFMANN-LA ROCHE INC. (US) | 1989-08-22 | — | — | US | disclosed |
| CN-87105777-A | Heterogeneous ring compound | — | 1988-04-06 | — | — | CN | disclosed |
| US-4268681-A | HERBICIDES, PLANT GROWTH REGULATORS, INSECTICIDES, MITICIDES | BAYER AKTIENGESELLSCHAFT (DE) | 1981-05-19 | — | — | US | disclosed |
| US-4185991-A | 4,5-Dichloro-imidazole derivatives and their use as herbicides | BAYER AKTIENGESELLSCHAFT (DE) | 1980-01-29 | — | — | US | disclosed |
| US-4178166-A | HERBICIDES, INSECTICIDES, PLANT GROWTH REGULATORS | BAYER AKTIENGESELLSCHAFT (DE) | 1979-12-11 | — | — | US | disclosed |
| US-4124765-A | ANTITUMOR | ONO PHARMACEUTICAL CO., LTD. (JP) | 1978-11-07 | — | — | US | disclosed |