SCHEMBL1594710

SCHEMBL1594710

C=C(CC(F)(F)C(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(=O)O

nearest known ligand 0.43

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 5/20 0.43
THRB P10828 1/20 0.34
TET3 O43151 1/20 0.32
TET1 Q8NFU7 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5165627 1.00 TET2 (0.43) TET2THRBTET3TET1
SCHEMBL2913284 0.78 TET2 (0.47) TET2TET3TET1
SCHEMBL6061456 0.76 TET2 (0.38) TET2THRBTET3TET1
SCHEMBL7768142 0.76 TET2 (0.38) TET2THRBTET3TET1
SCHEMBL2785403 0.74 TET2 (0.52) TET2THRBTET3TET1
SCHEMBL830693 0.74 TET2 (0.52) TET2THRBTET3TET1
SCHEMBL6561308 0.74 TET2 (0.52) TET2THRBTET3TET1
SCHEMBL613517 0.74 TET2 (0.52) TET2THRBTET3TET1
SCHEMBL941515 0.74 TET2 (0.52) TET2THRBTET3TET1
SCHEMBL2812628 0.74 TET2 (0.52) TET2THRBTET3TET1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3016088-B1 SUBSTRATE FOR ORGANIC ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING SAME LG CHEMICAL LTD (KR) 2019-11-06 EP disclosed
US-9790386-B2 Ink composition, two-pack curing ink composition set, and recording method and recorded matter using these SEIKO EPSON CORPORATION (JP) 2017-10-17 US disclosed
US-9278549-B2 Ink jet recording apparatus and ink jet recording method SEIKO EPSON CORPORATION (JP) 2016-03-08 US disclosed
US-20150368490-A1 Ink Composition, Two-Pack Curing Ink Composition Set, And Recording Method And Recorded Matter Using These SEIKO EPSON CORP (JP) 2015-12-24 US disclosed
US-20150210092-A1 INK JET RECORDING APPARATUS AND INK JET RECORDING METHOD SEIKO EPSON CORP (JP) 2015-07-30 US disclosed
US-9034939-B2 Primer for ink-jet recording HITACHI MAXELL, LTD. (JP) 2015-05-19 US disclosed
US-9028057-B2 Ink jet recording apparatus and ink jet recording method SEIKO EPSON CORPORATION (JP) 2015-05-12 US disclosed
US-20140063127-A1 INKJET INK COMPOSITION AND METHOD FOR PRODUCING THE SAME, INKJET RECORDING METHOD, PIGMENT DISPERSION FOR INKJET INK AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2014-03-06 US disclosed
US-20140066538-A1 INK COMPOSITION, IMAGE FORMING METHOD, AND PRINTED MATTER FUJIFILM CORPORATION (JP) 2014-03-06 US disclosed
US-8664291-B2 Ultraviolet-curable ink jet ink composition SEIKO EPSON CORPORATION (JP) 2014-03-04 US disclosed
US-20130267627-A1 PRIMER FOR INK-JET RECORDING HITACHI MAXELL, LTD. (JP) 2013-10-10 US disclosed
US-20120242768-A1 INK JET RECORDING METHOD, INK JET RECORDING APPARATUS, AND INK JET RECORDED MATTER RICOH COMPANY, LTD. (JP) 2012-09-27 US disclosed
CN-101265329-B Polydimethylsiloxane with initiator on surface and its preparation method and use XIONGMING MA 2011-06-22 CN disclosed
US-7919545-B2 Pigment dispersion and ink composition using the same FUJIFILM CORPORATION (JP) 2011-04-05 US disclosed
US-20100137509-A1 PIGMENT DISPERSION AND INK COMPOSITION USING THE SAME FUJIFILM CORPORATION (JP) 2010-06-03 US disclosed
CN-101265329-A Polydimethylsiloxane with initiator on surface and its preparation method and use XIONGMING MA (CN) 2008-09-17 CN disclosed
US-7025816-B2 Anthraquinone dye and inkjet recording liquid KONICA MINOLTA HOLDINGS, INC. (JP) 2006-04-11 US disclosed