Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FAAH | O00519 | 2/20 | 0.46 |
| ▸ | RELA | Q04206 | 4/20 | 0.42 |
| ▸ | CA2 | P00918 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | CA12 | O43570 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 1/20 | 0.37 |
| ▸ | CA7 | P43166 | 1/20 | 0.37 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14932179 | 0.98 | FAAH (0.50) | FAAHRELACA2KDM4EHPGD | |
| SCHEMBL301013 | 0.95 | FAAH (0.50) | FAAHRELACA2KDM4EHPGD | |
| SCHEMBL6501307 | 0.92 | FAAH (0.54) | FAAHRELACA2KDM4EHPGD | |
| SCHEMBL10226704 | 0.92 | FAAH (0.54) | FAAHRELACA2KDM4EHPGD | |
| SCHEMBL239451 | 0.87 | HPGD (0.44) | FAAHRELACA2KDM4EHPGD | |
| SCHEMBL13145951 | 0.83 | FAAH (0.44) | FAAHRELACA2KDM4EHPGD | |
| SCHEMBL15177331 | 0.82 | HPGD (0.41) | FAAHRELACA2KDM4EHPGD | |
| SCHEMBL3021423 | 0.81 | CA1 (0.33) | CA2CA12CA1CA7CA14 | |
| SCHEMBL9325375 | 0.81 | FAAH (0.43) | FAAHRELACA2KDM4EHPGD | |
| SCHEMBL12386317 | 0.81 | FAAH (0.48) | FAAHRELACA2KDM4EHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9223219-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-8808965-B2 | Pattern forming method, pattern, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |