⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL292251 | 0.88 | LMNA (0.48) | — | |
| SCHEMBL28610044 | 0.86 | LMNA (0.46) | — | |
| SCHEMBL11146584 | 0.86 | LMNA (0.46) | — | |
| Ether SCHEMBL11166465 | 0.85 | LMNA (0.41) | — | |
| SCHEMBL5165842 | 0.81 | LMNA (0.30) | — | |
| SCHEMBL499555 | 0.80 | — | — | |
| SCHEMBL16149961 | 0.80 | LMNA (0.33) | — | |
| SCHEMBL756803 | 0.79 | — | — | |
| Vinyl Ether SCHEMBL8399501 | 0.79 | LMNA (0.63) | — | |
| Water SCHEMBL27863122 | 0.78 | LMNA (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2276 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110515270-B | Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device | 信越化学工业株式会社 | 2024-07-12 | — | — | CN | claimed |
| US-11693317-B2 | Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | claimed |
| CN-110878147-B | Multi-section bar code nanorod and preparation method thereof | 嘉兴学院 | 2021-08-17 | — | — | CN | claimed |
| EP-3824989-A1 | DRAW SOLUTE, DRAW SOLUTION, AND FORWARD-OSMOSIS WATER TREATMENT METHOD | Maruzen Petrochemical Co., Ltd. (JP) | 2021-05-26 | — | — | EP | claimed |
| CN-112423865-A | Draw solute, draw solution and forward osmosis water treatment method | 丸善石油化学株式会社 | 2021-02-26 | — | — | CN | claimed |
| CN-111826022-A | UV (ultraviolet) photocuring high-corrosion-resistance and high-sensitivity liquid photosensitive ink and preparation method thereof | 张家港科思创感光新材料有限公司 | 2020-10-27 | — | — | CN | claimed |
| CN-111122024-A | Pressure sensor with multi-stimulus response structure | 武汉纺织大学 | 2020-05-08 | — | — | CN | claimed |
| CN-110987250-A | Flexible pressure sensor with multiple stimulus response structure | 武汉纺织大学 | 2020-04-10 | — | — | CN | claimed |
| CN-110878147-A | Multi-section bar code nanorod and preparation method thereof | 嘉兴学院 | 2020-03-13 | — | — | CN | claimed |
| WO-2020017588-A1 | DRAW SOLUTE, DRAW SOLUTION, AND FORWARD-OSMOSIS WATER TREATMENT METHOD | 丸善石油化学株式会社 | 2020-01-23 | — | — | WO | claimed |
| US-6559306-B2 | Fluorescent or non-fluorescent dye compounds having terminal hydroxy, carboxylic acid/ester or amino group; for dyeing or printing homo- or mixed synthetic, semi-synthetic or natural polymers or for inks | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-05-06 | — | — | US | claimed |
| US-20020133072-A1 | Graft polymerization of substrate surfaces | ANGIOTECH BIOCOATINGS CORP. | 2002-09-19 | — | — | US | claimed |
| EP-1214107-A1 | GRAFT POLYMERIZATION OF SUBSTRATE SURFACES | STS Biopolymers, Inc. (US) | 2002-06-19 | — | — | EP | claimed |
| US-6358557-B1 | EXPOSING A SUBSTRATE TO AN INITIATOR IN SOLUTION TO GENERATE REACTIVE RADICAL SITES ON THE SURFACE OF THE SUBSTRATE; CONTACTING WITH MONOMERS; GRAFT POLYMERIZING ONTO SUBSTRATE BY FORMING COVALENT BONDS BETWEEN MONOMER MOLECULES AND SUBSTRATE | STS BIOPOLYMERS, INC. | 2002-03-19 | — | — | US | claimed |
| WO-2001017575-A1 | GRAFT POLYMERIZATION OF SUBSTRATE SURFACES | STS BIOPOLYMERS, INC. (US) | 2001-03-15 | — | — | WO | claimed |
| US-4808716-A | VIRICIDES OR CHEMICAL INTERMEDIATES | CESKOSLOVENSKA AKADEMIC VED (CS) | 1989-02-28 | — | — | US | claimed |
| US-4791175-A | Particulate hydroperoxidized poly-n-vinyl lactam, its preparation and use thereof | CIBA-GEIGY CORPORATION (US) | 1988-12-13 | — | — | US | claimed |
| EP-0206459-A2 | 9-(Phosphonylmethoxyalkyl) adenines, method for their preparation and their use | Ceskoslovenska akademie ved (CS) | 1986-12-30 | — | — | EP | claimed |
| US-4396706-A | ADDITION INTERPOLYMER PARTICLES, MATTES | FUJI PHOTO FILM CO., LTD. (JP) | 1983-08-02 | — | — | US | claimed |
| US-4087574-A | PHOTOGRAPHY, VINYL OR VINYLIDENE CHLORIDE POLYMERS | FUJI PHOTO FILM CO., LTD. (JA) | 1978-05-02 | — | — | US | claimed |