SCHEMBL16015201

SCHEMBL16015201

CO[Si](CCCN(CCC[Si](OC)(OC)OC)S(=O)(=O)c1ccccc1)(OC)OC

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.54
TAS2R14 Q9NYV8 3/20 0.46
LMNA P02545 2/20 0.45
BMP1 P13497 2/20 0.45
HTT P42858 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
KMT2A Q03164 2/20 0.44
MEN1 O00255 1/20 0.44
KEAP1 Q14145 1/20 0.44
MMP3 P08254 1/20 0.43
CA12 O43570 2/20 0.42
CA9 Q16790 2/20 0.42
NR1I2 O75469 1/20 0.42
PTGES O14684 1/20 0.42
TAS2R8 Q9NYW2 1/20 0.42
CXCR3 P49682 1/20 0.42
CA2 P00918 1/20 0.42
RAB9A P51151 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
SLC22A6 Q4U2R8 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15959328 0.98 MAPK1 (0.52) MAPK1TAS2R14LMNABMP1HTT
SCHEMBL10312333 0.92 MAPK1 (0.47) MAPK1TAS2R14LMNABMP1HTT
SCHEMBL15702430 0.86 PDE4D (0.45) MAPK1LMNAHTTTDP1KMT2A
SCHEMBL15702436 0.86 MAPK1 (0.44) MAPK1TAS2R14LMNAHTTTDP1
SCHEMBL16015202 0.84 ESR1 (0.53) MAPK1LMNABMP1KMT2ANR1I2
SCHEMBL2057475 0.76 TDP1 (0.73) MAPK1LMNAHTTTDP1KMT2A
SCHEMBL1405872 0.76 PSIP1 (0.47) HTTKMT2AKEAP1MMP3
Hydrochloric Acid SCHEMBL18553842 0.76 MEN1 (0.37) LMNABMP1KMT2AMEN1
SCHEMBL15702328 0.76 KMT2A (0.51) LMNAKMT2AMEN1CA2SMN1; SMN2
SCHEMBL6497006 0.75 MAPK1 (0.65) MAPK1LMNAHTTTDP1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828879-B2 Silicon-containing composition having sulfonamide group for forming resist underlayer film NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-09 US disclosed