⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10447561 | 1.00 | — | — | |
| SCHEMBL19139253 | 1.00 | — | — | |
| SCHEMBL14642668 | 0.83 | HSD11B1 (0.37) | — | |
| SCHEMBL92295 | 0.83 | HSD11B1 (0.37) | — | |
| SCHEMBL17717875 | 0.76 | — | — | |
| SCHEMBL18456192 | 0.72 | — | — | |
| Adamantane SCHEMBL151782 | 0.69 | EPHX2 (0.34) | — | |
| SCHEMBL28188502 | 0.68 | HSD11B1 (0.42) | — | |
| SCHEMBL22416817 | 0.67 | HSD11B1 (0.33) | — | |
| SCHEMBL5917746 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9523914-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20160147150-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-26 | — | — | US | disclosed |
| US-9122152-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICALS CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| US-8828647-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-09 | — | — | US | disclosed |