Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10064066 | 0.85 | ALDH1A1 (0.38) | ALDH1A1 | |
| SCHEMBL16858287 | 0.81 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL26996583 | 0.81 | ALDH1A1 (0.40) | ALDH1A1THRB | |
| SCHEMBL25129600 | 0.81 | — | — | |
| SCHEMBL22788080 | 0.80 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL15426672 | 0.78 | BCHE (0.35) | — | |
| SCHEMBL13180423 | 0.78 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL22618185 | 0.77 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL22131520 | 0.77 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL19187317 | 0.77 | ALDH1A1 (0.33) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-20230099348-A1 | PHOTORESIST COMPOSITION COMPRISING AMIDE COMPOUND AND PATTERN FORMATION METHODS USING THE SAME | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2023-03-30 | — | — | US | disclosed |
| US-9563124-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9017924-B2 | Resist composition, method of forming resist pattern, polymeric compound and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20140255853-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-11 | — | — | US | disclosed |