SCHEMBL16026445

SCHEMBL16026445

O=C(c1cccnc1N1CCNCC1)N1CCCCC1

nearest known ligand 0.68

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 2/20 0.51
▸ MEN1 O00255 1/20 0.51
▸ CYP1A2 P05177 1/20 0.51
▸ CYP3A4 P08684 1/20 0.51
▸ CYP2C9 P11712 1/20 0.51
▸ CYP2C19 P33261 1/20 0.51
▸ ALDH1A1 P00352 1/20 0.49
▸ EPHX2 P34913 1/20 0.49
▸ RXFP1 Q9HBX9 1/20 0.48
▸ TSHR P16473 1/20 0.47
▸ HSD17B10 Q99714 1/20 0.47
▸ L3MBTL1 Q9Y468 1/20 0.46
▸ PRKCA P17252 2/20 0.44
▸ PRKCQ Q04759 2/20 0.44
▸ PRKCD Q05655 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13116812 0.88 SMN1; SMN2 (0.50) ALDH1A1EPHX2
SCHEMBL13116737 0.86 ALDH1A1 (0.59) KMT2AMEN1ALDH1A1TSHRHSD17B10
SCHEMBL615998 0.82 KMT2A (0.65) KMT2AMEN1CYP1A2CYP3A4CYP2C9
SCHEMBL6181431 0.81 EPHX2 (0.52) KMT2AALDH1A1EPHX2L3MBTL1PRKCA
SCHEMBL30945091 0.81 EPHX2 (0.52) KMT2AMEN1CYP1A2CYP3A4CYP2C9
SCHEMBL4538970 0.81 EPHX2 (0.52) KMT2AMEN1CYP1A2CYP3A4CYP2C9
SCHEMBL9999782 0.81 KDM4E (0.48) KMT2AMEN1CYP3A4CYP2C9ALDH1A1
Hydrochloric Acid SCHEMBL5901187 0.80 EPHX2 (0.51) KMT2AMEN1CYP1A2CYP3A4CYP2C9
SCHEMBL4536770 0.79 EPHX2 (0.50) KMT2AMEN1CYP1A2CYP3A4CYP2C9
SCHEMBL5557516 0.78 RXFP1 (0.55) KMT2AMEN1ALDH1A1RXFP1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140273458-A1 Chemical Mechanical Planarization for Tungsten-Containing Substrates AIR PRODUCTS AND CHEMICALS, INC. (US) 2014-09-18 — — US claimed
EP-2779217-A2 Chemical mechanical planarization for tungsten-containing substrates AIR PRODUCTS AND CHEMICALS, INC. (US) 2014-09-17 — — EP claimed
CN-104046246-A Chemical Mechanical Planarization for Tungsten-Containing Substrates AIR PROD & CHEM 2014-09-17 — — CN claimed
US-20140273458-A1 Chemical Mechanical Planarization for Tungsten-Containing Substrates AIR PRODUCTS AND CHEMICALS, INC. (US) 2014-09-18 — — US disclosed
EP-2779217-A2 Chemical mechanical planarization for tungsten-containing substrates AIR PRODUCTS AND CHEMICALS, INC. (US) 2014-09-17 — — EP disclosed
CN-104046246-A Chemical Mechanical Planarization for Tungsten-Containing Substrates AIR PROD & CHEM 2014-09-17 — — CN disclosed
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