SCHEMBL1602822

SCHEMBL1602822

CCC1COC1CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21425220 0.82 LGALS3 (0.42)
SCHEMBL24916758 0.82 LGALS3 (0.42)
SCHEMBL18270028 0.82 LGALS3 (0.42)
SCHEMBL24916903 0.82 LGALS3 (0.42)
SCHEMBL28715975 0.81
SCHEMBL28206089 0.81
SCHEMBL28440562 0.81
SCHEMBL1404426 0.80
SCHEMBL25238880 0.78 SPHK1 (0.41)
SCHEMBL3376087 0.78 SPHK1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1917316-B1 COATING MASS ALTANA ELEC INSULATION GMBH (DE) 2010-12-01 EP claimed
US-20090280237-A1 Coating Mass ALTANA ELECTRICAL INSULATION GMBH (DE) 2009-11-12 US claimed
EP-1917316-A1 COATING MASS Altana Electrical Insulation Gmbh (DE) 2008-05-07 EP claimed
WO-2007023165-A1 COATING MASS ALTANA ELECTRICAL INSULATION GMBH (DE) 2007-03-01 WO claimed
EP-0345073-A1 Poly (3-(Substituted)-3(Hydroxymethyl) oxetane) and method of preparing same ARIZONA BOARD OF REGENTS (US) 1989-12-06 EP claimed
US-4833183-A FILMS, FIBERS, MOLDING MATERIALS EXPLOSIVES ARIZONA BOARD OF REGENTS (US) 1989-05-23 US claimed
EP-3279278-B1 INK, IMAGE FORMING METHOD, AND LIQUID DISCHARGING DEVICE RICOH CO LTD (JP) 2022-01-26 EP disclosed
CN-107674499-B Ink, ink container, liquid discharging apparatus, image forming method and apparatus 株式会社理光 2021-07-13 CN disclosed
CN-112062675-A Monomer with free radical and cation dual curing functions, preparation method and radiation curing gravure ink 常州速固得感光新材料有限公司 2020-12-11 CN disclosed
CN-105837726-B Water-absorbent resin and method for producing same SK综合化学株式会社 2020-10-09 CN disclosed
WO-2020055085-A1 SEALANT COMPOSITION 주식회사 엘지화학 2020-03-19 WO disclosed
CN-105837725-B Water-absorbing resins and preparation method thereof SK新技术株式会社 2019-09-03 CN disclosed
CN-105837727-B Super absorbent resin and its preparation method SK新技术株式会社 2019-05-17 CN disclosed
US-20050176843-A1 Dental composites based on X-ray-opaque mixed oxides prepared by flame spraying IVOCLAR VIVADENT AG (DE) 2005-08-11 US disclosed
US-20040048975-A1 Dental composition based on a functionalised silicone crosslinkable and/or polymerisable by heat-process RHODIA CHIMIE (FR) 2004-03-11 US disclosed
US-6235358-B1 COATING LAYERS OF EPOXY RESINS AND PHOTOCATIONIC CURING CATALTST WITH CATIONIC SULFUR ESTERS, SENSITIZERS OF THIOXANTHONES AND TITANIUM DIOXIDE PIGMENTS TOYO SEIKAN KAISHA, LTD. (JP) 2001-05-22 US disclosed
US-6166228-A Process for the production of 3-alky-3-hydroxymethyloxetanes DAINIPPON INK AND CHEMICALS, INC. (JP) 2000-12-26 US disclosed
US-5861107-A ESTER INTERCHANGE OF 1,3-PROPANEDIOL COMPOUNDS WITH CARBONIC ACID ESTERS; DISTILLATIVE DEPOLYMERIZATION; CATALYSIS WITH TITANIUM OR ZIRCONIUM COMPOUND; PHOSPHORUS OR SULFUR COMPOUND STABILIZER BAYER AKTIENGESELLSCHAFT (DE) 1999-01-19 US disclosed
EP-0816354-A1 Process for preparing and stabilisation of aliphatic six-membered cyclic carbonates BAYER AG (DE) 1998-01-07 EP disclosed
EP-0000722-B1 PROCESS FOR THE PREPARATION OF POLYURETHANES CONTAINING ARYLSULFONIC ACID ALKYL ESTER GROUPS BAYER AG (DE) 1982-09-29 EP disclosed