SCHEMBL16043662

SCHEMBL16043662

CCCCOC(=O)N1CCN(c2ccc(CNC)cc2)CC1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 10/20 0.53
▸ LMNA P02545 5/20 0.53
▸ GAA P10253 3/20 0.53
▸ KDM4E B2RXH2 3/20 0.53
▸ SMN1; SMN2 Q16637 8/20 0.49
▸ KMT2A Q03164 4/20 0.49
▸ NPC1 O15118 2/20 0.49
▸ RAB9A P51151 2/20 0.49
▸ ME2 P23368 1/20 0.49
▸ ME1 P48163 1/20 0.49
▸ ME3 Q16798 1/20 0.49
▸ TP53 P04637 1/20 0.49
▸ NFKB1 P19838 1/20 0.49
▸ NFKB2 Q00653 1/20 0.49
▸ RELA Q04206 1/20 0.49
▸ POLB P06746 1/20 0.49
▸ ALDH1A1 P00352 5/20 0.48
▸ L3MBTL1 Q9Y468 1/20 0.48
▸ NCF1 P14598 1/20 0.47
▸ HTT P42858 3/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5539971 0.83 MAPT (0.76) MAPTLMNAGAAKDM4ESMN1; SMN2
SCHEMBL5539965 0.83 MAPT (0.59) MAPTLMNAGAAKDM4ESMN1; SMN2
SCHEMBL3313011 0.82 MAPT (0.58) MAPTLMNAGAAKDM4ESMN1; SMN2
SCHEMBL1459682 0.82 MAPT (0.57) MAPTLMNAGAAKDM4ESMN1; SMN2
Hydrochloric Acid SCHEMBL31540771 0.81 MAPT (0.57) MAPTLMNAGAAKDM4ESMN1; SMN2
SCHEMBL28072006 0.80 MAPT (0.56) MAPTLMNAGAAKDM4ESMN1; SMN2
SCHEMBL5138088 0.80 MAPT (0.56) MAPTLMNAGAAKDM4ESMN1; SMN2
SCHEMBL5541814 0.80 MAPT (0.74) MAPTLMNAGAAKDM4ESMN1; SMN2
SCHEMBL5541807 0.80 MAPT (0.58) MAPTLMNAGAAKDM4ESMN1; SMN2
SCHEMBL30045088 0.79 MAPT (0.54) MAPTLMNAGAAKDM4ESMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140273458-A1 Chemical Mechanical Planarization for Tungsten-Containing Substrates AIR PRODUCTS AND CHEMICALS, INC. (US) 2014-09-18 — — US claimed
US-20140273458-A1 Chemical Mechanical Planarization for Tungsten-Containing Substrates AIR PRODUCTS AND CHEMICALS, INC. (US) 2014-09-18 — — US disclosed
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