⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5030081 | 0.82 | HSD17B10 (0.33) | — | |
| SCHEMBL10771093 | 0.79 | — | — | |
| SCHEMBL3925982 | 0.79 | — | — | |
| SCHEMBL5028585 | 0.79 | — | — | |
| SCHEMBL6897119 | 0.79 | — | — | |
| SCHEMBL9798616 | 0.79 | HSD17B10 (0.35) | — | |
| SCHEMBL3400816 | 0.78 | HSD17B10 (0.30) | — | |
| SCHEMBL3851055 | 0.78 | — | — | |
| SCHEMBL9798624 | 0.77 | — | — | |
| SCHEMBL2200164 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 205 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119685960-A | Environment-friendly degradable heat-insulating fiber and preparation method thereof | 江阴市庆丰化纤有限公司 | 2025-03-25 | — | — | CN | claimed |
| CN-119242088-A | Super-hydrophobic anti-reflection self-cleaning coating material and preparation method thereof | 重庆大学 | 2025-01-03 | — | — | CN | claimed |
| CN-118222247-A | Phase-change temperature-regulating material, and preparation method and application thereof | 比亚迪股份有限公司 | 2024-06-21 | — | — | CN | claimed |
| CN-110235262-B | Composition for organic electronic device sealant and sealant formed using the same | 莫门蒂夫性能材料韩国株式会社 | 2023-07-18 | — | — | CN | claimed |
| US-10553824-B2 | Encapsulation composition for organic electronic device, and encapsulation formed using same | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. (KR) | 2020-02-04 | — | — | US | claimed |
| US-20190341579-A1 | ENCAPSULATION COMPOSITION FOR ORGANIC ELECTRONIC DEVICE, AND ENCAPSULATION FORMED USING SAME | MOMENTIVE PERFORMANCE MATERIALS INC. | 2019-11-07 | — | — | US | claimed |
| EP-3565014-A1 | ENCAPSULATION COMPOSITION FOR ORGANIC ELECTRONIC DEVICE, AND ENCAPSULATION FORMED USING SAME | Momentive Performance Materials Korea Co., Ltd. (KR) | 2019-11-06 | — | — | EP | claimed |
| WO-2009021256-A1 | METHOD FOR PRODUCING OPTICAL WAVEGUIDES BASED ON A ORGANOPOLYSILOXANE AND PRINTED CIRCUIT BOARD AND USE | AT & S AUSTRIA TECHNOLOGIE & SYSTEMTECHNIK AKTIENGESELLSCHAFT (AT) | 2009-02-19 | — | — | WO | claimed |
| WO-2008075293-A1 | ADDITIVES TO STABILIZE CYCLOTETRASILOXANE AND ITS DERIVATIVES | L'AIR LIQUIDE-SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2008-06-26 | — | — | WO | claimed |
| US-20080141901-A1 | ADDITIVES TO STABILIZE CYCLOTETRASILOXANE AND ITS DERIVATIVES | AMERICAN AIR LIQUIDE, INC. (US) | 2008-06-19 | — | — | US | claimed |
| EP-0802934-A1 | FUNCTIONALIZED POLYMER AND METHODS TO OBTAIN FUNCTIONALIZED POLYMER | EXXON CHEMICAL PATENTS INC. (US) | 1997-10-29 | — | — | EP | claimed |
| WO-1996021685-A1 | FUNCTIONALIZED POLYMER AND METHODS TO OBTAIN FUNCTIONALIZED POLYMER | EXXON CHEMICAL PATENTS INC. (US) | 1996-07-18 | — | — | WO | claimed |
| JP-61275283-A | — | — | None | — | — | JP | disclosed |
| JP-61275282-A | — | — | None | — | — | JP | disclosed |
| EP-4749682-A1 | CURABLE COMPOSITION, FILM FORMING METHOD, AND METHOD FOR PRODUCING ARTICLE | Canon Kabushiki Kaisha (JP) | 2026-05-27 | — | — | EP | disclosed |
| US-20260140445-A1 | CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE | CANON KK (JP) | 2026-05-21 | — | — | US | disclosed |
| EP-0032713-B1 | PHOSPHONIUM SALTS, PROCESS FOR THEIR PREPARATION AND THEIR USE AS STARTING MATERIALS IN THE PREPARATION OF UNSATURATED BICYCLIC COMPOUNDS | FIRMENICH SA (CH) | 1984-07-18 | — | — | EP | disclosed |
| EP-0090615-A2 | Method for forming fine resist patterns | Hitachi, Ltd. (JP) | 1983-10-05 | — | — | EP | disclosed |
| US-4387250-A | Phosphonium salts, process for their preparation and use of same as starting materials for preparing unsaturated bicyclic compounds | FIRMENICH SA (CH) | 1983-06-07 | — | — | US | disclosed |
| EP-0032713-A2 | Phosphonium salts, process for their preparation and their use as starting materials in the preparation of unsaturated bicyclic compounds | FIRMENICH SA (CH) | 1981-07-29 | — | — | EP | disclosed |