SCHEMBL1605006

SCHEMBL1605006

CC(C)(C)COCCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methylene Chloride SCHEMBL3565257 0.83 CYP2C19 (0.36)
SCHEMBL18191 0.78 CYP2C19 (0.42)
Methylene Chloride SCHEMBL3581296 0.78 CYP2C19 (0.33)
Hydrochloric Acid SCHEMBL8858515 0.74 CYP2C19 (0.40)
SCHEMBL28557000 0.74 CYP2C19 (0.40)
Chloroform SCHEMBL4544169 0.73 CYP2C19 (0.35)
SCHEMBL12309553 0.73
Methyl Alcohol SCHEMBL4271767 0.72 CYP2C19 (0.38)
Fluoride SCHEMBL15313130 0.72 CYP2C19 (0.38)
Ethylene SCHEMBL4765785 0.72 CYP2C19 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111875500-A Photosensitive photoresist resin monomer containing polycyclic beta-ketone structure and synthetic method thereof 徐州博康信息化学品有限公司 2020-11-03 CN disclosed
CN-111138288-A Photoresist resin monomer containing five-membered ring β -ketone structure and synthetic method thereof 上海博栋化学科技有限公司 2020-05-12 CN disclosed
US-9242963-B2 Organic compounds NOVARTIS AG (CH) 2016-01-26 US disclosed
US-9242963-B2 Organic compounds NOVARTIS AG (CH) 2016-01-26 US disclosed
US-9242963-B2 Organic compounds NOVARTIS AG (CH) 2016-01-26 US disclosed
US-9235122-B2 Monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-12 US disclosed
US-9235122-B2 Monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-12 US disclosed
US-9213235-B2 Patterning process, resist composition, polymer, and monomer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-15 US disclosed
US-9213235-B2 Patterning process, resist composition, polymer, and monomer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-15 US disclosed
US-9140988-B2 Positive resist composition, monomer, polymer, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-09-22 US disclosed
US-7807331-B2 Hydrogenated ring-opening metathesis polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-10-05 US disclosed
WO-2009156462-A2 ORGANIC COMPOUNDS NOVARTIS AG (CH) 2009-12-30 WO disclosed
WO-2009156462-A2 ORGANIC COMPOUNDS NOVARTIS AG (CH) 2009-12-30 WO disclosed
US-20090186307-A1 HYDROGENATED RING-OPENING METATHESIS POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS MITSUI CHEMICALS, INC. (JP) 2009-07-23 US disclosed
CN-1711504-A Resist composition ASAHI GLASS CO LTD (JP) 2005-12-21 CN disclosed
US-4329437-A POLYURETHANES, CONSTRUCTION MATERIALS BLOUNT DAVID H 1982-05-11 US disclosed
US-4314916-A Process for the production of broken down lignin-cellulose silicate copolymers BLOUNT DAVID H 1982-02-09 US disclosed
US-4283311-A Process for the production of broken down cellulose copolymers BLOUNT DAVID H 1981-08-11 US disclosed
US-4281110-A Process for the production of broken down lignin-cellulose silicate copolymers BLOUNT DAVID H 1981-07-28 US disclosed
US-4124765-A ANTITUMOR ONO PHARMACEUTICAL CO., LTD. (JP) 1978-11-07 US disclosed