Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.46 |
| ▸ | XDH | P47989 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.45 |
| ▸ | CA1 | P00915 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | MMP1 | P03956 | 1/20 | 0.43 |
| ▸ | MMP2 | P08253 | 1/20 | 0.43 |
| ▸ | MMP9 | P14780 | 1/20 | 0.43 |
| ▸ | MMP8 | P22894 | 1/20 | 0.43 |
| ▸ | MMP13 | P45452 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | CASP6 | P55212 | 1/20 | 0.43 |
| ▸ | F2 | P00734 | 3/20 | 0.41 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.41 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.41 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.41 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1607305 | 0.83 | HSD17B10 (0.57) | ALDH1A1HSD17B10CYP2C19POLBCA1 | |
| SCHEMBL14323535 | 0.82 | CA1 (0.48) | ALDH1A1GAACYP2C19XDHPOLB | |
| SCHEMBL10774587 | 0.79 | ALDH1A1 (0.47) | ALDH1A1GAAHSD17B10CYP2C19POLB | |
| SCHEMBL27447483 | 0.78 | ALDH1A1 (0.50) | ALDH1A1GAAHSD17B10CYP2C19POLB | |
| SCHEMBL11227002 | 0.78 | ALDH1A1 (0.50) | ALDH1A1GAAHSD17B10CYP2C19POLB | |
| SCHEMBL155353 | 0.77 | CA1 (0.68) | ALDH1A1GAAHSD17B10CYP2C19POLB | |
| SCHEMBL29022400 | 0.77 | ALDH1A1 (0.49) | ALDH1A1GAAHSD17B10CYP2C19POLB | |
| SCHEMBL152784 | 0.76 | ALDH1A1 (0.59) | ALDH1A1GAAHSD17B10CYP2C19XDH | |
| Potassium SCHEMBL14988998 | 0.76 | CA1 (0.66) | ALDH1A1GAAHSD17B10CYP2C19POLB | |
| SCHEMBL14988995 | 0.76 | CA1 (0.66) | ALDH1A1GAAHSD17B10CYP2C19POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8313892-B2 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | FUJITSU LIMITED (JP) | 2012-11-20 | — | — | US | claimed |
| EP-2138897-B1 | CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF RESIST PATTERN | FUJITSU LTD (JP) | 2016-08-03 | — | — | EP | disclosed |
| US-8795951-B2 | Material for forming resist sensitization film and production method of semiconductor device | FUJITSU LIMITED (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8557144-B2 | Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head | FUJITSU LIMITED (JP) | 2013-10-15 | — | — | US | disclosed |
| US-8313892-B2 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | FUJITSU LIMITED (JP) | 2012-11-20 | — | — | US | disclosed |
| US-20110081615-A1 | MATERIAL FOR FORMING RESIST SENSITIZATION FILM AND PRODUCTION METHOD OF SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-04-07 | — | — | US | disclosed |
| US-20100009296-A1 | MATERIAL FOR FORMING CONDUCTIVE ANTIREFLECTION FILM, METHOD FOR FORMING CONDUCTIVE ANTIREFLECTION FILM, METHOD FOR FORMING RESIST PATTERN, SEMICONDUCTOR DEVICE, AND MAGNETIC HEAD | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2138897-A1 | MATERIAL FOR FORMATION OF CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF RESIST PATTERN, SEMICONDUCTOR DEVICE, AND MAGNETIC HEAD | Fujitsu Limited (JP) | 2009-12-30 | — | — | EP | disclosed |
| EP-1612603-A2 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | FUJITSU LIMITED (JP) | 2006-01-04 | — | — | EP | disclosed |
| US-20050277055-A1 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | FUJITSU LIMITED (JP) | 2005-12-15 | — | — | US | disclosed |
| EP-0662694-B1 | Soluble aniline conducting polymers | MITSUBISHI RAYON CO (JP) | 2002-02-27 | — | — | EP | disclosed |
| US-5932144-A | ALKOXY GROUP SUBSTITUTED AMINOBENZENESULFONIC ACID, OR SALT THEREOF | MITSUBISHI RAYON CO., LTD. (JP) | 1999-08-03 | — | — | US | disclosed |
| US-5700399-A | Soluble alkoxy-group substituted aminobenzenesulfonic acid aniline conducting polymers | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1997-12-23 | — | — | US | disclosed |
| US-5589108-A | Soluble alkoxy-group substituted aminobenzenesulfonic acid aniline conducting polymers | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1996-12-31 | — | — | US | disclosed |
| EP-0662694-A2 | Soluble aniline conducting polymers | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1995-07-12 | — | — | EP | disclosed |