SCHEMBL16074765

SCHEMBL16074765

CCCCCCCCCC(O)CC(C)(C)O

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 8/20 0.48
FFAR1 O14842 2/20 0.47
FFAR4 Q5NUL3 1/20 0.47
SPHK1 Q9NYA1 2/20 0.42
PSMD14 O00487 2/20 0.42
PLA2G1B P04054 2/20 0.42
MMP2 P08253 2/20 0.42
ATG4B Q9Y4P1 2/20 0.42
HSP90AA1 P07900 1/20 0.42
RAD52 P43351 1/20 0.42
LMNA P02545 2/20 0.41
NFKB1 P19838 1/20 0.41
FDPS P14324 1/20 0.41
GMNN O75496 1/20 0.39
POLB P06746 1/20 0.39
CYP2D6 P10635 1/20 0.39
THPO P40225 1/20 0.39
MTOR P42345 1/20 0.39
BLM P54132 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8682478 1.00 GPR84 (0.48) GPR84FFAR1FFAR4SPHK1PSMD14
SCHEMBL16074899 1.00 GPR84 (0.48) GPR84FFAR1FFAR4SPHK1PSMD14
SCHEMBL16074918 1.00 GPR84 (0.48) GPR84FFAR1FFAR4SPHK1PSMD14
SCHEMBL16074729 1.00 GPR84 (0.48) GPR84FFAR1FFAR4SPHK1PSMD14
SCHEMBL16074881 1.00 GPR84 (0.48) GPR84FFAR1FFAR4SPHK1PSMD14
SCHEMBL16074810 1.00 GPR84 (0.48) GPR84FFAR1FFAR4SPHK1PSMD14
SCHEMBL16074962 1.00 GPR84 (0.48) GPR84FFAR1FFAR4SPHK1PSMD14
SCHEMBL16074751 1.00 GPR84 (0.48) GPR84FFAR1FFAR4SPHK1PSMD14
SCHEMBL16074782 1.00 GPR84 (0.48) GPR84FFAR1FFAR4SPHK1PSMD14
SCHEMBL16074717 0.98 GPR84 (0.45) GPR84FFAR1FFAR4SPHK1PSMD14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9188866-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-17 US disclosed
US-9176382-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-03 US disclosed
US-9176382-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-03 US disclosed
US-20140273448-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273448-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed