Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16077456 | 0.83 | TSHR (0.43) | TSHR | |
| SCHEMBL18096783 | 0.83 | TSHR (0.32) | TSHR | |
| SCHEMBL18096795 | 0.83 | TSHR (0.32) | TSHR | |
| SCHEMBL21578820 | 0.83 | TSHR (0.38) | TSHR | |
| SCHEMBL28969418 | 0.77 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL8445953 | 0.76 | ALDH1A1 (0.41) | TSHRALDH1A1CYP2C19 | |
| SCHEMBL3168756 | 0.75 | — | — | |
| SCHEMBL975267 | 0.73 | — | — | |
| SCHEMBL592132 | 0.73 | — | — | |
| Phosphine SCHEMBL27893486 | 0.73 | ALDH1A1 (0.39) | TSHRALDH1A1CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9188866-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |