⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1609090 | 0.93 | — | — | |
| SCHEMBL8852288 | 0.86 | — | — | |
| SCHEMBL3815430 | 0.85 | LMNA (0.32) | — | |
| SCHEMBL8851757 | 0.85 | — | — | |
| SCHEMBL13089082 | 0.80 | — | — | |
| SCHEMBL1609067 | 0.79 | — | — | |
| SCHEMBL4614482 | 0.77 | — | — | |
| SCHEMBL28642807 | 0.77 | PRKD3 (0.30) | — | |
| SCHEMBL8923212 | 0.76 | — | — | |
| SCHEMBL28648974 | 0.76 | TSHR (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 123 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230257503-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| EP-4212256-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | Mitsubishi Chemical Corporation (JP) | 2023-07-19 | — | — | EP | disclosed |
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| US-11413682-B2 | Method for producing surface-modified metal oxide fine particle, method for producing improved metal oxide fine particles, surface-modified metal oxide fine particles, and metal oxide fine particle dispersion liquid | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| US-20220220338-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| US-20220213348-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-07 | — | — | US | disclosed |
| US-11377522-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica-based coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-05 | — | — | US | disclosed |
| EP-3971229-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-03-23 | — | — | EP | disclosed |
| WO-2022054912-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | 三菱ケミカル株式会社 | 2022-03-17 | — | — | WO | disclosed |
| WO-2003022937-A1 | POLYSILOXANE SOLS WHICH CAN BE THERMALLY CURED AND CURED BY ACTINIC RADIATION, METHOD FOR THE PRODUCTION AND USE THEREOF | BASF COATINGS AG (DE) | 2003-03-20 | — | — | WO | disclosed |
| WO-2003022938-A2 | MATERIAL MIXTURE HARDENED THERMALLY AND WITH ACTINIC RADIATION, METHOD FOR PRODUCTION AND USE THEREOF | BASF COATINGS AG (DE) | 2003-03-20 | — | — | WO | disclosed |
| US-6515073-B2 | Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| EP-1208170-A1 | SOL-GEL COATING | BASF Coatings Aktiengesellschaft (DE) | 2002-05-29 | — | — | EP | disclosed |
| EP-1208171-A1 | SOL-GEL COATING | BASF Coatings AG (DE) | 2002-05-29 | — | — | EP | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |
| WO-2001016242-A1 | SOL-GEL COATING | BASF COATINGS AG (DE) | 2001-03-08 | — | — | WO | disclosed |
| WO-2001016241-A1 | SOL-GEL COATING | BASF COATINGS AG (DE) | 2001-03-08 | — | — | WO | disclosed |
| US-5594079-A | COORDINATION CATALYST CONTAINING BORON, STEREOREGULAR POLYPROPYLENE | TOSOH CORPORATION (JP) | 1997-01-14 | — | — | US | disclosed |
| EP-0582278-A2 | Method for producing a polyolefin | TOSOH CORPORATION (JP) | 1994-02-09 | — | — | EP | disclosed |