SCHEMBL16078697

SCHEMBL16078697

CCCCCCCCCCC(O)C(O)CCCO

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.59
CYP2D6 P10635 2/20 0.59
SPHK1 Q9NYA1 2/20 0.59
GMNN O75496 1/20 0.59
POLB P06746 1/20 0.59
THPO P40225 1/20 0.59
MTOR P42345 1/20 0.59
BLM P54132 1/20 0.59
KDM4E B2RXH2 1/20 0.59
TP53 P04637 1/20 0.59
CYP1A2 P05177 1/20 0.59
CYP3A4 P08684 1/20 0.59
MAPT P10636 1/20 0.59
CETP P11597 1/20 0.59
HTT P42858 1/20 0.59
UBE2N P61088 1/20 0.59
PTPN1 P18031 1/20 0.58
ALDH1A1 P00352 2/20 0.57
MEN1 O00255 2/20 0.57
KMT2A Q03164 2/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16078622 1.00 LMNA (0.59) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL16078673 1.00 LMNA (0.59) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL16078658 1.00 LMNA (0.59) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL3895284 0.95 LMNA (0.65) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL15508603 0.95 LMNA (0.65) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL23081061 0.95 LMNA (0.65) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL21552422 0.95 LMNA (0.65) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL15505935 0.95 LMNA (0.65) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL1707475 0.95 LMNA (0.65) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL10881142 0.95 LMNA (0.65) LMNACYP2D6SPHK1GMNNPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9176382-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-03 US disclosed
US-20140273448-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed