Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPAR3 | Q9UBY5 | 6/20 | 0.38 |
| ▸ | LPAR2 | Q9HBW0 | 5/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | THRB | P10828 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 8/20 | 0.34 |
| ▸ | CA2 | P00918 | 8/20 | 0.34 |
| ▸ | CA9 | Q16790 | 8/20 | 0.34 |
| ▸ | CA12 | O43570 | 3/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.33 |
| ▸ | CA3 | P07451 | 2/20 | 0.33 |
| ▸ | CA4 | P22748 | 2/20 | 0.33 |
| ▸ | CA6 | P23280 | 2/20 | 0.33 |
| ▸ | CA5A | P35218 | 2/20 | 0.33 |
| ▸ | CA7 | P43166 | 2/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9009701 | 0.97 | LPAR3 (0.41) | LPAR3LPAR2LMNATHRBTSHR | |
| SCHEMBL9009719 | 0.97 | LPAR3 (0.41) | LPAR3LPAR2LMNATHRBTSHR | |
| SCHEMBL4809082 | 0.95 | LPAR3 (0.38) | LPAR3LPAR2LMNATHRBTSHR | |
| SCHEMBL28367822 | 0.92 | LPAR3 (0.41) | LPAR3LPAR2LMNATHRBTSHR | |
| SCHEMBL9009725 | 0.92 | LPAR3 (0.41) | LPAR3LPAR2LMNATHRBTSHR | |
| SCHEMBL4810661 | 0.92 | LPAR3 (0.41) | LPAR3LPAR2LMNATHRBTSHR | |
| SCHEMBL10390610 | 0.92 | LPAR3 (0.41) | LPAR3LPAR2LMNATHRBTSHR | |
| SCHEMBL9009724 | 0.92 | LPAR3 (0.41) | LPAR3LPAR2LMNATHRBTSHR | |
| SCHEMBL7012322 | 0.92 | LPAR3 (0.41) | LPAR3LPAR2LMNATHRBTSHR | |
| SCHEMBL9009713 | 0.92 | LPAR3 (0.41) | LPAR3LPAR2LMNATHRBTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250066242-A1 | AN ARTICLE HAVING ANTI-CONTAMINATION SURFACE AND A METHOD FOR FORMING ANTI-CONTAMINATION SURFACE | LG CHEM, LTD. (KR) | 2025-02-27 | — | — | US | disclosed |
| EP-4484505-A1 | PRODUCT HAVING ANTI-FOULING SURFACE, AND METHOD FOR FORMING ANTI-FOULING SURFACE | LG Chem, Ltd. (KR) | 2025-01-01 | — | — | EP | disclosed |
| US-20240392142-A1 | ARTICLE FOR ANTIFOULING | LG CHEM, LTD. (KR) | 2024-11-28 | — | — | US | disclosed |
| CN-119013357-A | Article having a contamination-resistant surface and method for forming a contamination-resistant surface | 株式会社LG化学 | 2024-11-22 | — | — | CN | disclosed |
| EP-4421134-A1 | ANTIFOULING ARTICLE | LG Chem, Ltd. (KR) | 2024-08-28 | — | — | EP | disclosed |
| CN-118265755-A | Product for scale prevention | 株式会社LG化学 | 2024-06-28 | — | — | CN | disclosed |
| CN-116075368-B | Resin composition, cured product, method for producing same, and laminate | 三菱化学株式会社 | 2024-06-11 | — | — | CN | disclosed |
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230257503-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| EP-4212256-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | Mitsubishi Chemical Corporation (JP) | 2023-07-19 | — | — | EP | disclosed |
| US-20130061922-A1 | DIFFUSION AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR CELL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-14 | — | — | US | disclosed |
| EP-2472655-A1 | Negative electrode base member | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2012-07-04 | — | — | EP | disclosed |
| US-20110079262-A1 | DIFFUSING AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR BATTERY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-07 | — | — | US | disclosed |
| US-20110017291-A1 | DIFFUSING AGENT COMPOSITION FOR INK-JET, AND METHOD FOR PRODUCTION OF ELECTRODE OR SOLAR BATTERY USING THE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-01-27 | — | — | US | disclosed |
| US-20100119939-A1 | NEGATIVE ELECTRODE BASE MEMBER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-13 | — | — | US | disclosed |
| EP-2131423-A1 | NEGATIVE ELECTRODE BASE MEMBER | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2009-12-09 | — | — | EP | disclosed |
| US-20080318165-A1 | Composition For Forming Antireflective Film And Wiring Forming Method Using Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-12-25 | — | — | US | disclosed |
| US-7332446-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-02-19 | — | — | US | disclosed |
| CN-1542071-A | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device | ��Խ��ѧ��ҵ��ʽ���� | 2004-11-03 | — | — | CN | disclosed |
| US-20040188809-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. | 2004-09-30 | — | — | US | disclosed |