SCHEMBL4809082

SCHEMBL4809082

CCCCCO[Si](CCCCC)(OCCCCC)OCCCCC

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LPAR3 Q9UBY5 6/20 0.38
LPAR2 Q9HBW0 5/20 0.38
LMNA P02545 1/20 0.38
THRB P10828 2/20 0.35
TSHR P16473 1/20 0.35
CA1 P00915 8/20 0.34
CA2 P00918 8/20 0.34
CA9 Q16790 8/20 0.34
CA12 O43570 3/20 0.34
MEN1 O00255 1/20 0.34
HTT P42858 1/20 0.34
KMT2A Q03164 1/20 0.34
MAPT P10636 1/20 0.34
LPAR1 Q92633 2/20 0.33
CA3 P07451 2/20 0.33
CA4 P22748 2/20 0.33
CA6 P23280 2/20 0.33
CA5A P35218 2/20 0.33
CA7 P43166 2/20 0.33
CA14 Q9ULX7 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7012322 0.97 LPAR3 (0.41) LPAR3LPAR2LMNATHRBTSHR
SCHEMBL9009713 0.97 LPAR3 (0.41) LPAR3LPAR2LMNATHRBTSHR
SCHEMBL9009724 0.97 LPAR3 (0.41) LPAR3LPAR2LMNATHRBTSHR
SCHEMBL10390610 0.97 LPAR3 (0.41) LPAR3LPAR2LMNATHRBTSHR
SCHEMBL28367822 0.97 LPAR3 (0.41) LPAR3LPAR2LMNATHRBTSHR
SCHEMBL4810661 0.97 LPAR3 (0.41) LPAR3LPAR2LMNATHRBTSHR
SCHEMBL9009725 0.97 LPAR3 (0.41) LPAR3LPAR2LMNATHRBTSHR
SCHEMBL1607986 0.95 LPAR3 (0.38) LPAR3LPAR2LMNATHRBTSHR
SCHEMBL2398745 0.95 LMNA (0.38) LPAR3LPAR2LMNATHRBTSHR
SCHEMBL9009701 0.92 LPAR3 (0.41) LPAR3LPAR2LMNATHRBTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4692011-A1 TOP PLATE FOR COOKING DEVICE, PRODUCTION METHOD THEREFOR, AND METHOD FOR ASSESSING CHARRING Nippon Electric Glass Co., Ltd. (JP) 2026-02-11 EP disclosed
US-20250066242-A1 AN ARTICLE HAVING ANTI-CONTAMINATION SURFACE AND A METHOD FOR FORMING ANTI-CONTAMINATION SURFACE LG CHEM, LTD. (KR) 2025-02-27 US disclosed
EP-4484505-A1 PRODUCT HAVING ANTI-FOULING SURFACE, AND METHOD FOR FORMING ANTI-FOULING SURFACE LG Chem, Ltd. (KR) 2025-01-01 EP disclosed
US-20240392142-A1 ARTICLE FOR ANTIFOULING LG CHEM, LTD. (KR) 2024-11-28 US disclosed
CN-119013357-A Article having a contamination-resistant surface and method for forming a contamination-resistant surface 株式会社LG化学 2024-11-22 CN disclosed
WO-2024204213-A1 TOP PLATE FOR COOKING DEVICE, PRODUCTION METHOD THEREFOR, AND METHOD FOR ASSESSING CHARRING 日本電気硝子株式会社 2024-10-03 WO disclosed
EP-4421134-A1 ANTIFOULING ARTICLE LG Chem, Ltd. (KR) 2024-08-28 EP disclosed
CN-118265755-A Product for scale prevention 株式会社LG化学 2024-06-28 CN disclosed
WO-2024072004-A1 ANTIFOULING ARTICLE 주식회사 엘지화학 2024-04-04 WO disclosed
WO-2023224420-A1 PRODUCT HAVING ANTI-FOULING SURFACE, AND METHOD FOR FORMING ANTI-FOULING SURFACE 주식회사 엘지화학 2023-11-23 WO disclosed
US-20160027946-A1 OPTICAL DEVICE JSR CORPORATION (JP) 2016-01-28 US disclosed
US-7332446-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-02-19 US disclosed
CN-1542071-A Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device ��Խ��ѧ��ҵ��ʽ���� 2004-11-03 CN disclosed
US-20040188809-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2004-09-30 US disclosed