SCHEMBL1608394

SCHEMBL1608394

C=C(C=CCCC)C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 1/20 0.41
TAS1R1 Q7RTX1 1/20 0.41
PTPN1 P18031 1/20 0.37
PPARG P37231 3/20 0.35
PPARA Q07869 3/20 0.35
EP300 Q09472 1/20 0.33
ALDH1A1 P00352 1/20 0.33
HCAR2 Q8TDS4 1/20 0.33
GRIK1 P39086 1/20 0.32
GRIK2 Q13002 1/20 0.32
ACHE P22303 1/20 0.32
BACE1 P56817 1/20 0.32
GMNN O75496 1/20 0.32
USP2 O75604 1/20 0.32
LMNA P02545 1/20 0.32
CYP1A2 P05177 1/20 0.32
POLB P06746 1/20 0.32
MAPT P10636 1/20 0.32
CYP2C9 P11712 1/20 0.32
ALOX15 P16050 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1608392 1.00 TAS1R3 (0.41) TAS1R3TAS1R1PTPN1PPARGPPARA
SCHEMBL1682386 0.87 F7 (0.47) PTPN1PPARGPPARAGMNNUSP2
SCHEMBL1682383 0.87 F7 (0.47) PTPN1PPARGPPARAGMNNUSP2
SCHEMBL10295983 0.84 PPARG (0.54) PTPN1PPARGPPARAGMNNUSP2
SCHEMBL11161474 0.84 PPARG (0.54) PTPN1PPARGPPARAGMNNUSP2
SCHEMBL6655809 0.84 PPARG (0.54) PTPN1PPARGPPARAGMNNUSP2
SCHEMBL11550561 0.84 PPARG (0.54) PTPN1PPARGPPARAGMNNUSP2
SCHEMBL11546604 0.84 PPARG (0.54) PTPN1PPARGPPARAGMNNUSP2
SCHEMBL9021396 0.84 PPARG (0.54) PTPN1PPARGPPARAGMNNUSP2
SCHEMBL8469325 0.84 PPARG (0.54) PTPN1PPARGPPARAGMNNUSP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113906065-B Copolymer for polymer electrolyte, gel polymer electrolyte including the same, and lithium secondary battery 株式会社LG新能源 2024-05-28 CN disclosed
CN-114957258-A Synthesis of wide-spectrum serine beta-lactamase inhibitor based on carbapenem structure and application of inhibitor in drug-resistant bacteria inhibition 华东理工大学 2022-08-30 CN disclosed
WO-2021253302-A1 CONDUCTIVE COMPOSITION FOR SECONDARY BATTERY GUANGDONG HAOZHI TECHNOLOGY CO. LIMITED (CN) 2021-12-23 WO disclosed
US-8673539-B2 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-03-18 US disclosed
US-8445177-B2 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part HITACHI CHEMICAL COMPANY, LTD. (JP) 2013-05-21 US disclosed
US-20130062787-A1 PHOTOSENSITIVE ADHESIVE COMPOSITION, AND OBTAINED USING THE SAME, ADHESIVE FILM, ADHESIVE SHEET, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND ELECTRONIC PART RESONAC CORPORATION (JP) 2013-03-14 US disclosed
US-8323873-B2 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-12-04 US disclosed
US-8293453-B2 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-10-23 US disclosed
US-8278024-B2 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-10-02 US disclosed
EP-2333609-A2 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part Hitachi Chemical Company, Ltd. (JP) 2011-06-15 EP disclosed
US-20110079927-A1 PHOTOSENSITIVE ADHESIVE COMPOSITION, AND OBTAINED USING THE SAME, ADHESIVE FILM, ADHESIVE SHEET, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND ELECTRONIC PART RESONAC CORPORATION (JP) 2011-04-07 US disclosed
US-20110065043-A1 PHOTOSENSITIVE ADHESIVE COMPOSITION, AND OBTAINED USING THE SAME, ADHESIVE FILM, ADHESIVE SHEET, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND ELECTRONIC PART RESONAC CORPORATION (JP) 2011-03-17 US disclosed
US-20110065260-A1 PHOTOSENSITIVE ADHESIVE COMPOSITION, AND OBTAINED USING THE SAME, ADHESIVE FILM, ADHESIVE SHEET, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND ELECTRONIC PART KAWAMORI TAKASHI 2011-03-17 US disclosed
US-20100314783-A1 PHOTOSENSITIVE ADHESIVE COMPOSITION, AND OBTAINED USING THE SAME, ADHESIVE FILM, ADHESIVE SHEET, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND ELECTRONIC PART KAWAMORI TAKASHI 2010-12-16 US disclosed
US-7851131-B2 Photopolymerization; polyimides; photomasks; wafers; sheets; films HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-12-14 US disclosed
US-20080176167-A1 Photopolymerization; polyimides; photomasks; wafers; sheets; films RESONAC CORPORATION (JP) 2008-07-24 US disclosed
EP-1901123-A1 PHOTOSENSITIVE ADHESIVE COMPOSITION, AND OBTAINED USING THE SAME, ADHESIVE FILM, ADHESIVE SHEET, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND ELECTRONIC PART HITACHI CHEMICAL COMPANY, LTD. (JP) 2008-03-19 EP disclosed
US-5633112-A Photosensitive resin composition containing a carboxylic acid polymer, photoacid generator and secondary or tertiary aliphatic amine HITACHI, LTD. (JP) 1997-05-27 US disclosed
EP-0177791-A2 Radiation curable primer coating compositions SUMITOMO METAL INDUSTRIES, LTD. (JP) 1986-04-16 EP disclosed