Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL1615433

N.N.N.N.N.N.N.N.O=P(O)(O)F.O=P(O)(O)F.O=P(O)(O)F.O=P(O)(O)F

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.42
SLC34A1 Q06495 1/20 0.39
KDM4E B2RXH2 1/20 0.36
MMP2 P08253 1/20 0.36
THRB P10828 1/20 0.36
MAPK1 P28482 1/20 0.36
HSD17B10 Q99714 1/20 0.36
FDPS P14324 1/20 0.36
BLM P54132 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
PGK1 P00558 1/20 0.33
PGK2 P07205 1/20 0.33
TYMS P04818 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL4463637 1.00 CA2 (0.42) CA2SLC34A1KDM4EMMP2THRB
Ammonia Solution, Strong SCHEMBL77058 1.00
Ammonia Solution, Strong SCHEMBL4366322 1.00 CA2 (0.42) CA2SLC34A1KDM4EMMP2THRB
Ammonia Solution, Strong SCHEMBL77057 1.00
Ammonia Solution, Strong SCHEMBL1289331 0.95
Ammonia Solution, Strong SCHEMBL1289334 0.95
Ammonia Solution, Strong SCHEMBL28489717 0.95
Ammonia Solution, Strong SCHEMBL21836186 0.95 CA2 (0.39) CA2SLC34A1KDM4EMMP2THRB
SCHEMBL634685 0.94 CA2 (0.46) CA2SLC34A1KDM4EMMP2THRB
SCHEMBL31402615 0.94 CA2 (0.46) CA2SLC34A1KDM4EMMP2THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10205163-B2 Battery with anode active material with oxide coating on active particles MURATA MANUFACTURING CO., LTD. (JP) 2019-02-12 US claimed
US-4844781-A CARBON FIBERS EMBEDDED IN A MATRIX OF SYNTHETIC RESIN OFFICE NATIONAL D'ETUDES ET DE RECHERCHES AEROSPATIALES (FR) 1989-07-04 US claimed
CN-112041970-B Aqueous composition and cleaning method using same 三菱瓦斯化学株式会社 2025-02-07 CN disclosed
US-11352593-B2 Aqueous composition and cleaning method using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-06-07 US disclosed
US-20210155881-A1 AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-05-27 US disclosed
EP-3787010-A1 AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-03 EP disclosed
CN-112041970-A Aqueous composition and cleaning method using the same 三菱瓦斯化学株式会社 2020-12-04 CN disclosed
US-10205163-B2 Battery with anode active material with oxide coating on active particles MURATA MANUFACTURING CO., LTD. (JP) 2019-02-12 US disclosed
EP-2821458-B1 ELECTROLYTE SOLUTION, PRINTING METHOD THEREOF AND RESULTING SOLID ELECTROLYTE YD YNVISIBLE S A (PT) 2018-09-19 EP disclosed
EP-2665118-B1 METHOD FOR PRODUCING FUEL CELL ELECTRODE CATALYST, FUEL CELL ELECTRODE CATALYST, AND APPLICATION THEREOF SHOWA DENKO KK (JP) 2018-04-11 EP disclosed
US-9625782-B2 Electrolyte solution, printing method thereof and resulting solid electrolyte YD YNVISIBLE, S.A. (PT) 2017-04-18 US disclosed
US-20140361211-A1 ELECTROLYTE SOLUTION, PRINTING METHOD THEREOF AND RESULTING SOLID ELECTROLYTE YD YNVISIBLE, S.A. (PT) 2014-12-11 US disclosed
US-20140135246-A1 CLEANING COMPOSITION, CLEANING PROCESS, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2014-05-15 US disclosed
US-8669217-B2 Cleaning composition, cleaning process, and process for producing semiconductor device FUJIFILM CORPORATION (JP) 2014-03-11 US disclosed
EP-2665118-A1 METHOD FOR PRODUCING FUEL CELL ELECTRODE CATALYST, FUEL CELL ELECTRODE CATALYST, AND APPLICATION THEREOF Showa Denko K.K. (JP) 2013-11-20 EP disclosed
US-20130288154-A1 METHOD FOR PRODUCING FUEL CELL ELECTRODE CATALYST, FUEL CELL ELECTRODE CATALYST, AND USES THEREOF SHOWA DENKO K.K. (JP) 2013-10-31 US disclosed
US-20110237480-A1 CLEANING COMPOSITION, CLEANING PROCESS, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2011-09-29 US disclosed
US-20110086269-A1 ANODE AND METHOD OF MANUFACTURING THE SAME, AND BATTERY AND METHOD OF MANUFACTURING THE SAME SONY CORPORATION (JP) 2011-04-14 US disclosed
US-20090092892-A1 ANODE AND METHOD OF MANUFACTURING THE SAME, AND BATTERY AND METHOD OF MANUFACTURING THE SAME SONY CORPORATION (JP) 2009-04-09 US disclosed
US-4844781-A CARBON FIBERS EMBEDDED IN A MATRIX OF SYNTHETIC RESIN OFFICE NATIONAL D'ETUDES ET DE RECHERCHES AEROSPATIALES (FR) 1989-07-04 US disclosed