⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL432066 | 0.93 | — | — | |
| Water SCHEMBL28313887 | 0.89 | — | — | |
| Cyclopropane SCHEMBL27752609 | 0.83 | — | — | |
| SCHEMBL17099434 | 0.76 | — | — | |
| Ethyne SCHEMBL28263396 | 0.74 | — | — | |
| Biphenyl SCHEMBL8087057 | 0.70 | ALDH1A1 (0.43) | — | |
| SCHEMBL2784770 | 0.65 | — | — | |
| SCHEMBL109023 | 0.65 | — | — | |
| SCHEMBL15525005 | 0.65 | — | — | |
| SCHEMBL14163938 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7799705-B1 | Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups | NOVELLUS SYSTEMS, INC. (US) | 2010-09-21 | — | — | US | claimed |
| US-7473653-B1 | Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups | NOVELLUS SYSTEMS, INC. (US) | 2009-01-06 | — | — | US | claimed |
| US-7241704-B1 | Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups | NOVELLUS SYSTEMS, INC. (US) | 2007-07-10 | — | — | US | claimed |
| US-7923385-B2 | Methods for producing low stress porous and CDO low-K dielectric materials using precursors with organic functional groups | NOVELLUS SYSTEMS, INC. (US) | 2011-04-12 | — | — | US | disclosed |
| US-7799705-B1 | Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups | NOVELLUS SYSTEMS, INC. (US) | 2010-09-21 | — | — | US | disclosed |
| US-20090239390-A1 | METHODS FOR PRODUCING LOW STRESS POROUS AND CDO LOW-K DIELECTRIC MATERIALS USING PRECURSORS WITH ORGANIC FUNCTIONAL GROUPS | NOVELLUS SYSTEMS, INC. (US) | 2009-09-24 | — | — | US | disclosed |
| US-7479191-B1 | Method for endpointing CVD chamber cleans following ultra low-k film treatments | NOVELLUS SYSTEMS, INC. (US) | 2009-01-20 | — | — | US | disclosed |
| US-7473653-B1 | Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups | NOVELLUS SYSTEMS, INC. (US) | 2009-01-06 | — | — | US | disclosed |
| US-7241704-B1 | Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups | NOVELLUS SYSTEMS, INC. (US) | 2007-07-10 | — | — | US | disclosed |