Known targets — ChEMBL curated mechanism
FGFR1FGFR2FGFR3FGFR4FLT1FLT4KDRPDGFRAPDGFRB
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTDSP1 | Q9GZU7 | 2/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.30 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL4245931 | 0.95 | CTDSP1 (0.31) | CTDSP1CA1CA2MAPTPOLB | |
| Sulfuric Acid SCHEMBL21195039 | 0.93 | CTDSP1 (0.30) | CTDSP1CA1CA2MAPTPOLB | |
| SCHEMBL4245800 | 0.93 | CTDSP1 (0.30) | CTDSP1CA1CA2MAPTPOLB | |
| Sulfuric Acid SCHEMBL17102575 | 0.91 | CA1 (0.33) | CA1CA2 | |
| SCHEMBL28470575 | 0.88 | PSMD14 (0.33) | POLB | |
| Trifluoromethanesulfonic Acid SCHEMBL1330266 | 0.87 | KCNH2 (0.35) | CTDSP1MAPT | |
| SCHEMBL294563 | 0.87 | — | — | |
| SCHEMBL9934567 | 0.86 | — | — | |
| Iodide SCHEMBL2037552 | 0.85 | CTDSP1 (0.39) | CTDSP1CA1CA2MAPTPOLB | |
| Fluoride Ion SCHEMBL1900591 | 0.85 | CTDSP1 (0.35) | CTDSP1CA1CA2MAPTPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1848790-B1 | SEMICONDUCTOR CLEANING | ADVANCED PROCESS TECHNOLOGIES LLC (US) | 2015-04-08 | — | — | EP | disclosed |
| US-20110187010-A1 | SEMICONDUCTOR CLEANING USING SUPERACIDS | SMALL ROBERT J | 2011-08-04 | — | — | US | disclosed |
| US-7923424-B2 | Semiconductor cleaning using superacids | ADVANCED PROCESS TECHNOLOGIES, LLC (US) | 2011-04-12 | — | — | US | disclosed |
| EP-1848790-A2 | SEMICONDUCTOR CLEANING | Small, Robert J. (US) | 2007-10-31 | — | — | EP | disclosed |
| WO-2006088737-A2 | SEMICONDUCTOR CLEANING | SMALL ROBERT J (US) | 2006-08-24 | — | — | WO | disclosed |
| US-20060183248-A1 | Semiconductor cleaning using superacids | ADVANCED PROCESS TECHNOLOGIES, LLC | 2006-08-17 | — | — | US | disclosed |
| US-20060183654-A1 | Semiconductor cleaning using ionic liquids | ADVANCED PROCESS TECHNOLOGIES, LLC | 2006-08-17 | — | — | US | disclosed |