SCHEMBL1617909

SCHEMBL1617909

C=C[Si](C)(C=C)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3629212 0.78
SCHEMBL9654054 0.77
SCHEMBL59248 0.77
SCHEMBL63316 0.77
SCHEMBL28034998 0.74
SCHEMBL29151370 0.74
SCHEMBL28108038 0.74
SCHEMBL28159892 0.74
SCHEMBL15302455 0.74 TSHR (0.39)
SCHEMBL335426 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250188615-A1 Gapfill Methods and Processing Assemblies ASM IP HOLDING B.V. (NL) 2025-06-12 US claimed
US-20240117494-A1 Gapfill methods and processing assemblies ASM IP HOLDING B.V. (NL) 2024-04-11 US claimed
CN-103865389-B A kind of using method of add-on type solvent-free organic silicon interleaving agent 惠州市永卓科技有限公司 2016-08-03 CN claimed
CN-104710621-A Phenyl vinyl silicon resin for adhering base as well as preparation method and application thereof SHENZHEN CAPCHEM TECHNOLOGY CO LTD 2015-06-17 CN claimed
CN-103865389-A Preparation method of novel addition-type solvent-free organosilicone isolation agent HUIZHOU YOZHO SCIENCE & TECHNOLOGY CO LTD 2014-06-18 CN claimed
US-7799705-B1 Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups NOVELLUS SYSTEMS, INC. (US) 2010-09-21 US claimed
US-7473653-B1 Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups NOVELLUS SYSTEMS, INC. (US) 2009-01-06 US claimed
US-7241704-B1 Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups NOVELLUS SYSTEMS, INC. (US) 2007-07-10 US claimed
JP-3928071-B2 2007-06-13 JP claimed
CN-1151690-A Dental impression material with cure-indicating dye MINNESOTA MINING & MFG (US) 1997-06-11 CN claimed
EP-0768860-A2 DENTAL IMPRESSION MATERIAL WITH CURE-INDICATING DYE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-04-23 EP claimed
US-5596025-A POLYSILOXANE CURABLE BY HYDROSILATION REACTION, COLOR CHANGE ON CURING MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-01-21 US claimed
WO-1996000560-A2 DENTAL IMPRESSION MATERIAL WITH CURE-INDICATING DYE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-01-11 WO claimed
US-20250389016-A1 GAS BARRIER FILM MATERIAL, SILICON OXIDE FILM, AND PRODUCTION METHOD OF SILICON OXIDE FILM TOSOH CORP (JP) 2025-12-25 US disclosed
EP-4656667-A1 CURABLE COMPOSITION Shin-Etsu Chemical Co., Ltd. (JP) 2025-12-03 EP disclosed
US-20250289954-A1 HEAT-CURABLE PERFLUOROPOLYETHER RUBBER COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-18 US disclosed
WO-1996000560-A2 DENTAL IMPRESSION MATERIAL WITH CURE-INDICATING DYE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-01-11 WO disclosed
US-5446113-A Method for making heat curable zero valent platinum-vinylsilane silicone compositions GENERAL ELECTRIC COMPANY (US) 1995-08-29 US disclosed
US-5371162-A Curable silicone polymer, crosslinker, Karstedt platinum catalyst, amine stabilizer MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1994-12-06 US disclosed
EP-0579132-A1 Storage-stable silicone composition MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1994-01-19 EP disclosed