SCHEMBL335426

SCHEMBL335426

C=C[Si](C=C)(C=C)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30939443 0.97
SCHEMBL3482094 0.77 TSHR (0.30)
SCHEMBL21494561 0.76
SCHEMBL19356602 0.76 ALDH1A1 (0.35)
SCHEMBL27823328 0.75
SCHEMBL22548 0.75
SCHEMBL121771 0.75
SCHEMBL9651725 0.75
SCHEMBL5077011 0.75
SCHEMBL9654054 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 582 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12331164-B2 Curable siloxane resin composition KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2025-06-17 US claimed
WO-2025118622-A1 LITHIUM-ION BATTERY 深圳新宙邦科技股份有限公司 2025-06-12 WO claimed
US-20250163346-A1 TREATMENT COMPOSITIONS PROCTER & GAMBLE (US) 2025-05-22 US claimed
CN-119905656-A Electrolyte, preparation method of electrolyte and lithium ion battery 惠州亿纬锂能股份有限公司 2025-04-29 CN claimed
CN-119823671-A Corrosion-resistant POE packaging adhesive film for TOPCon battery assembly and preparation method thereof 常州斯威克光伏新材料有限公司 2025-04-15 CN claimed
CN-119752195-A High-temperature-resistant corrosion-resistant silicon rubber sealing ring and preparation method thereof 吴江兴业橡胶有限公司 2025-04-04 CN claimed
US-12215299-B2 Treatment compositions THE PROCTER & GAMBLE COMPANY (US) 2025-02-04 US claimed
CN-117497825-B Lithium ion battery 深圳新宙邦科技股份有限公司 2025-01-14 CN claimed
CN-119119483-A High-dispersity low-thermal-weight-loss vinyl MQ silicon resin and preparation method thereof 湖北兴瑞硅材料有限公司 2024-12-13 CN claimed
CN-119029172-A Continuous preparation method and device for silicon-carbon anode material based on multistage gas-solid reactor 天津大学 2024-11-26 CN claimed
US-20070173071-A1 SiCOH dielectric INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-07-26 US claimed
US-7211522-B2 Method of forming thick silica-based film NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-05-01 US claimed
US-20060189163-A1 Method of forming thick silica-based film NISSAN CHEMICAL INDUSTRIES LTD. (JP) 2006-08-24 US claimed
US-20060165891-A1 SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-07-27 US claimed
US-20060079099-A1 Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-04-13 US claimed
US-20050245715-A1 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. 2005-11-03 US claimed
US-20050194619-A1 SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2005-09-08 US claimed
EP-1312659-A1 ADHESIVE COMPOSITION AND OPTICAL DEVICE USING THE SAME Nippon Sheet Glass Co., Ltd. (JP) 2003-05-21 EP claimed
US-20020074086-A1 Adhesive composition and optical device using the same NIPPON SHEET GLASS CO., LTD. (JP) 2002-06-20 US claimed
US-5538829-A Toner compositions with zinc and boron charge enhancing additives XEROX CORPORATION (US) 1996-07-23 US claimed