⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20439588 | 0.85 | — | — | |
| SCHEMBL140778 | 0.81 | — | — | |
| SCHEMBL20439589 | 0.80 | — | — | |
| Ammonia Solution, Strong SCHEMBL15375362 | 0.78 | — | — | |
| SCHEMBL15375244 | 0.78 | — | — | |
| SCHEMBL12422312 | 0.76 | — | — | |
| SCHEMBL111870 | 0.75 | — | — | |
| SCHEMBL15375536 | 0.73 | — | — | |
| SCHEMBL14350654 | 0.73 | — | — | |
| Ammonia Solution, Strong SCHEMBL15375272 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11204552-B2 | Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2021-12-21 | — | — | US | disclosed |
| US-20200041902-A9 | RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2020-02-06 | — | — | US | disclosed |
| US-9645492-B2 | Coloring composition, colored cured film, color filter, solid-state image sensor and image display device | FUJIFILM CORPORATION (JP) | 2017-05-09 | — | — | US | disclosed |
| EP-1764652-B1 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORP (JP) | 2014-10-22 | — | — | EP | disclosed |